Ferromagnetism in reactive sputtered Cu0.96Fe 0.04O1-δ nanocrystalline films evidenced by anomalous Hall effect
KAUST DepartmentAdvanced Nanofabrication, Imaging and Characterization Core Lab
Imaging and Characterization Core Lab
Material Science and Engineering Program
Physical Science and Engineering (PSE) Division
Permanent link to this recordhttp://hdl.handle.net/10754/561732
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AbstractCu0.96Fe0.04O1-δ nanocrystalline films were fabricated using reactive sputtering at different oxygen partial pressures (PO2). The electrical transport properties of the films were measured in a broad temperature range (10-300 K) under magnetic fields of up to 5T. Anomalous Hall effect (AHE) of up to 0.4μΩ cm was observed at 10 K and decreased to 0.2μΩ cm at 300 K. The characteristic AHE clearly indicated the existence of ferromagnetism in these materials. The AHE weakened as PO2 increased because the increasing PO2 reduced the fraction of Fe2+ ions, and consequently weakened the double exchange coupling between Fe2+-O2--Cu2+ in the materials. © 2011 The Japan Society of Applied Physics.
CitationMi, W., Bai, H., Zhang, Q., Zhang, B., & Zhang, X. (2011). Ferromagnetism in Reactive Sputtered Cu0.96Fe0.04O1-δNanocrystalline Films Evidenced by Anomalous Hall Effect. Applied Physics Express, 4(4), 043001. doi:10.1143/apex.4.043001
SponsorsThis work was supported by the National Natural Science Foundation of China (Nos. 50701033 and 51002104), and the Doctoral Program of Higher Education of China (No. 20070056047), Natural Science Foundation of Tianjin (No. 08JCYBJC09400) and Young Faculty Foundation of Tianjin University (TJU-YFF-08B52 and 08A05).
JournalApplied Physics Express