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dc.contributor.authorWu, Jinbo
dc.contributor.authorZhang, Mengying
dc.contributor.authorChen, Longqing
dc.contributor.authorYu, Vivian
dc.contributor.authorTin-Yum Wong, Joseph
dc.contributor.authorZhang, Xixiang
dc.contributor.authorQin, Jianhua
dc.contributor.authorWen, Weijia
dc.date.accessioned2015-08-03T09:01:58Z
dc.date.available2015-08-03T09:01:58Z
dc.date.issued2011
dc.identifier.citationWu, J., Zhang, M., Chen, L., Yu, V., Tin-Yum Wong, J., Zhang, X., … Wen, W. (2011). Patterning cell using Si-stencil for high-throughput assay. RSC Advances, 1(5), 746. doi:10.1039/c1ra00520k
dc.identifier.issn20462069
dc.identifier.doi10.1039/c1ra00520k
dc.identifier.urihttp://hdl.handle.net/10754/561671
dc.description.abstractIn this communication, we report a newly developed cell pattering methodology by a silicon-based stencil, which exhibited advantages such as easy handling, reusability, hydrophilic surface and mature fabrication technologies. Cell arrays obtained by this method were used to investigate cell growth under a temperature gradient, which demonstrated the possibility of studying cell behavior in a high-throughput assay. This journal is © The Royal Society of Chemistry 2011.
dc.description.sponsorshipThis work is supported by Hong Kong RGC grant HKUST 604710 and research grant RPC10SC01, respectively.
dc.publisherRoyal Society of Chemistry (RSC)
dc.titlePatterning cell using Si-stencil for high-throughput assay
dc.typeArticle
dc.contributor.departmentAdvanced Nanofabrication, Imaging and Characterization Core Lab
dc.contributor.departmentCore Labs
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentKAUST-HKUST Micro/Nanofluidic Joint Laboratory
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalRSC Advances
dc.contributor.institutionDivision of Life Science, Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong, Hong Kong
dc.contributor.institutionDalian Institute of Chemical Physics, Chinese Academy of Sciences, 457, Zhongshan Road, 11603, China
kaust.personChen, Longqing
kaust.personZhang, Xixiang


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