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    Far infrared near normal specular reflectivity of Nix(SiO2)1-x (x = 1.0, 0.84, 0.75, 0.61, 0.54, 0.28) granular films

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    Type
    Article
    Authors
    Massa, Néstor E.
    Denardin, Juliano C.
    Socolovsky, Leandro M.
    Knobel, Marcelo
    De La Cruz, Fernando Pablo
    Zhang, Xixiang cc
    KAUST Department
    Imaging and Characterization Core Lab
    Material Science and Engineering Program
    Physical Science and Engineering (PSE) Division
    Date
    2010-04
    Permanent link to this record
    http://hdl.handle.net/10754/561466
    
    Metadata
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    Abstract
    One of the current issues at the basis of the understanding of novel materials is the degree of the role played by spatial inhomogeneities due to subtle phase separations. To clarify this picture here we compare the plain glass network response of transition metal granular films with different metal fractions against what is known for conducting oxides. Films for Nix(SiO2)1-x (x = 1.0, 0.84, 0.75, 0.61, 0.54, 0.28) were studied by temperature dependent far infrared measurements. While for pure Ni the spectrum shows a flat high reflectivity, those for x ∼ 0.84 and ∼0.75 have a Drude component, vibrational modes mostly carrier screened, and a long tail that extents toward near infrared. This is associated with hopping electron conductivity and strong electron-phonon interactions. The relative reduction of the number of carriers in Ni0.75(SiO2)0.25 allows less screened phonon bands on the top of a continuum and a wide and overdamped oscillator at mid-infrared frequencies. Ni0.54(SiO2)0.46 and Ni0.28(SiO2)0.72 have well defined vibrational bands and a sharp threshold at ∼1450 cm-1. It is most remarkable that a distinctive resonant peak at ∼1250 cm-1 found for p-polarized angle dependent specular reflectivity. It originates in an electron cloud traced to electrons that are not able to overcome the metal-dielectric interface that, beating against the positive background, generates the electric dipole. Overall, we conclude that the spectra are analogous to those regularly found in conducting oxides where with a suitable percolating network polarons are formed. © 2009 Elsevier B.V. All rights reserved.
    Citation
    Massa, N. E., Denardin, J. C., Socolovsky, L. M., Knobel, M., de la Cruz, F. P., & Zhang, X. (2010). Far infrared near normal specular reflectivity of Nix(SiO2)1−x (x=1.0, 0.84, 0.75, 0.61, 0.54, 0.28) granular films. Journal of Alloys and Compounds, 495(2), 638–641. doi:10.1016/j.jallcom.2009.10.228
    Publisher
    Elsevier BV
    Journal
    Journal of Alloys and Compounds
    DOI
    10.1016/j.jallcom.2009.10.228
    ae974a485f413a2113503eed53cd6c53
    10.1016/j.jallcom.2009.10.228
    Scopus Count
    Collections
    Articles; Imaging and Characterization Core Lab; Physical Science and Engineering (PSE) Division; Material Science and Engineering Program

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