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dc.contributor.authorAlias, Mohd Sharizal
dc.contributor.authorDursun, Ibrahim
dc.contributor.authorShi, Dong
dc.contributor.authorSaidaminov, Makhsud I.
dc.contributor.authorDiallo, Elhadj
dc.contributor.authorPriante, Davide
dc.contributor.authorNg, Tien Khee
dc.contributor.authorBakr, Osman
dc.contributor.authorOoi, Boon S.
dc.date.accessioned2015-08-02T06:27:05Z
dc.date.available2015-08-02T06:27:05Z
dc.date.issued2015-07-30
dc.identifier.citationFocused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications 2015, 33 (5):051207 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
dc.identifier.issn2166-2746
dc.identifier.issn2166-2754
dc.identifier.doi10.1116/1.4927542
dc.identifier.urihttp://hdl.handle.net/10754/561391
dc.description.abstractThe coherent amplified spontaneous emission and high photoluminescence quantum efficiency of organolead trihalide perovskite have led to research interest in this material for use in photonic devices. In this paper, the authors present a focused-ion beam patterning strategy for methylammonium lead tribromide (MAPbBr3) perovskite crystal for subwavelength grating nanophotonic applications. The essential parameters for milling, such as the number of scan passes, dwell time, ion dose, ion current, ion incident angle, and gas-assisted etching, were experimentally evaluated to determine the sputtering yield of the perovskite. Based on our patterning conditions, the authors observed that the sputtering yield ranged from 0.0302 to 0.0719 μm3/pC for the MAPbBr3 perovskite crystal. Using XeF2 for the focused-ion beam gas-assisted etching, the authors determined that the etching rate was reduced to between 0.40 and 0.97, depending on the ion dose, compared with milling with ions only. Using the optimized patterning parameters, the authors patterned binary and circular subwavelength grating reflectors on the MAPbBr3 perovskite crystal using the focused-ion beam technique. Based on the computed grating structure with around 97% reflectivity, all of the grating dimensions (period, duty cycle, and grating thickness) were patterned with nanoscale precision (>±3 nm), high contrast, and excellent uniformity. Our results provide a platform for utilizing the focused-ion beam technique for fast prototyping of photonic nanostructures or nanodevices on organolead trihalide perovskite.
dc.description.sponsorshipThe authors gratefully acknowledge the funding support from KAUST and King Abdulaziz City for Science and Technology TIC (Technology Innovation Center) for Solid-State Lighting at KAUST.
dc.language.isoen
dc.publisherAmerican Vacuum Society
dc.relation.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/5/10.1116/1.4927542
dc.rightsArchived with thanks to Journal of Vacuum Science & Technology B. © 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
dc.subjectSputtering
dc.subjectDielectric oxides
dc.subjectMilling
dc.subjectFocused ion beam technology
dc.subjectDiffraction gratings
dc.titleFocused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentFunctional Nanomaterials Lab (FuNL)
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentKAUST Catalysis Center (KCC)
dc.contributor.departmentKAUST Solar Center (KSC)
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentNanofabrication Core Lab
dc.contributor.departmentPhotonics Laboratory
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.contributor.departmentThermal & Deposition
dc.identifier.journalJournal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
dc.eprint.versionPublisher's Version/PDF
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personAlias, Mohd Sharizal
kaust.personShi, Dong
kaust.personDiallo, Elhadj
kaust.personDursun, Ibrahim
kaust.personSaidaminov, Makhsud I.
kaust.personPriante, Davide
kaust.personNg, Tien Khee
kaust.personBakr, Osman M.
kaust.personOoi, Boon S.
refterms.dateFOA2018-06-14T07:30:03Z
kaust.acknowledged.supportUnitTechnology Innovation Center
dc.date.published-online2015-07-30
dc.date.published-print2015-09


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