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    AuthorChang, Wen-Hao (1)Han, Ali (1)He, Jr-Hau (1)
    Hsu, Wei-Ting (1)
    Hu, Weijin (1)View MoreDepartment
    Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division (1)
    Electrical Engineering Program (1)
    KAUST Solar Center (KSC) (1)Materials Science and Engineering Program (1)
    Physical Sciences and Engineering (PSE) Division (1)
    JournalAdvanced Functional Materials (1)KAUST Grant NumberCRF-2015-2634-CRG4 (1)CRF-2016-2996-CRG5 (1)Publisher
    Wiley (1)
    Subjecthexagonal α-In2Se3 (1)layered 2D materials (1)monolayer (1)room-temperature ferroelectricity (1)View MoreTypeArticle (1)Year (Issue Date)
    2018 (1)
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    Room-Temperature Ferroelectricity in Hexagonally Layered α-In2\nSe3\n Nanoflakes down to the Monolayer Limit

    Xue, Fei; Hu, Weijin; Lee, Ko-Chun; Lu, Li-Syuan; Zhang, Junwei; Tang, Hao-Ling; Han, Ali; Hsu, Wei-Ting; Tu, Shao Bo; Chang, Wen-Hao; Lien, Chen-Hsin; He, Jr-Hau; Zhang, Zhidong; Li, Lain-Jong; Zhang, Xixiang (Advanced Functional Materials, Wiley, 2018-10-21) [Article]
    2D ferroelectric material has emerged as an attractive building block for high-density data storage nanodevices. Although monolayer van der Waals ferroelectrics have been theoretically predicted, a key experimental breakthrough for such calculations is still not realized. Here, hexagonally stacking α-InSe nanoflake, a rarely studied van der Waals polymorph, is reported to exhibit out-of-plane (OOP) and in-plane (IP) ferroelectricity at room temperature. Ferroelectric multidomain states in a hexagonal α-InSe nanoflake with uniform thickness can survive to 6 nm. Most strikingly, the electric-field-induced polarization switching and hysteresis loop are, respectively, observed down to the bilayer and monolayer (≈1.2 nm) thicknesses, which designates it as the thinnest layered ferroelectric and verifies the corresponding theoretical calculation. In addition, two types of ferroelectric nanodevices employing the OOP and IP polarizations in 2H α-InSe are developed, which are applicable for nonvolatile memories and heterostructure-based nanoelectronics/optoelectronics.
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