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    Scaling of the anomalous Hall current in Fe100−x(SiO2)x films

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    PhysRevB.83.205311.pdf
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    Description:
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    Type
    Article
    Authors
    Xu, W. J.
    Zhang, Bei
    Wang, Qingxiao
    Mi, W. B.
    Wang, Z.
    Li, W.
    Yu, R. H.
    Zhang, Xixiang cc
    KAUST Department
    Imaging and Characterization Core Lab
    Material Science and Engineering Program
    Physical Science and Engineering (PSE) Division
    Date
    2011-05-20
    Permanent link to this record
    http://hdl.handle.net/10754/553021
    
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    Abstract
    To study the origin of the anomalous Hall effect, Fe100−x(SiO2)x granular films with a volume fraction of SiO2 (0 ⩽ x ⩽ 40.51) were fabricated using cosputtering. Hall and longitudinal resistivities were measured in the temperature range of 5–350 K with magnetic fields up to 5 T. As x increased from 0 to 40.51, the anomalous Hall resistivity and longitudinal resistivity increased by about four and three orders in magnitude, respectively. Analysis of the results revealed that the normalized anomalous Hall conductivity is a constant for all of the samples, which may suggest a scattering-independent anomalous Hall conductivity in Fe.
    Citation
    Scaling of the anomalous Hall current in Fe100−x(SiO2)x films, 2011, 83 (20) Physical Review B
    Publisher
    American Physical Society (APS)
    Journal
    Physical Review B
    DOI
    10.1103/PhysRevB.83.205311
    arXiv
    1004.2105
    Additional Links
    http://link.aps.org/doi/10.1103/PhysRevB.83.205311
    ae974a485f413a2113503eed53cd6c53
    10.1103/PhysRevB.83.205311
    Scopus Count
    Collections
    Articles; Imaging and Characterization Core Lab; Physical Science and Engineering (PSE) Division; Material Science and Engineering Program

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