Type
ArticleKAUST Department
Imaging and Characterization Core LabMaterial Science and Engineering Program
Physical Science and Engineering (PSE) Division
Date
2011-05-20Permanent link to this record
http://hdl.handle.net/10754/553021
Metadata
Show full item recordAbstract
To study the origin of the anomalous Hall effect, Fe100−x(SiO2)x granular films with a volume fraction of SiO2 (0 ⩽ x ⩽ 40.51) were fabricated using cosputtering. Hall and longitudinal resistivities were measured in the temperature range of 5–350 K with magnetic fields up to 5 T. As x increased from 0 to 40.51, the anomalous Hall resistivity and longitudinal resistivity increased by about four and three orders in magnitude, respectively. Analysis of the results revealed that the normalized anomalous Hall conductivity is a constant for all of the samples, which may suggest a scattering-independent anomalous Hall conductivity in Fe.Citation
Scaling of the anomalous Hall current in Fe100−x(SiO2)x films, 2011, 83 (20) Physical Review BPublisher
American Physical Society (APS)Journal
Physical Review BarXiv
1004.2105Additional Links
http://link.aps.org/doi/10.1103/PhysRevB.83.205311ae974a485f413a2113503eed53cd6c53
10.1103/PhysRevB.83.205311