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dc.contributor.authorPark, Jihwey
dc.contributor.authorSoh, Yeong-Ah
dc.contributor.authorAeppli, Gabriel
dc.contributor.authorDavid, Adrian
dc.contributor.authorLin, Weinan
dc.contributor.authorWu, Tao
dc.date.accessioned2015-05-04T16:28:31Z
dc.date.available2015-05-04T16:28:31Z
dc.date.issued2014-02-24
dc.identifier.citationInfluence of oxygen pressure and aging on LaAlO3 films grown by pulsed laser deposition on SrTiO3 substrates 2014, 104 (8):081604 Applied Physics Letters
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.doi10.1063/1.4866439
dc.identifier.urihttp://hdl.handle.net/10754/552166
dc.description.abstractThe crystal structures of LaAlO3 films grown by pulsed laser deposition on SrTiO3 substrates at oxygen pressure of 10−3 millibars or 10−5 millibars, where kinetics of ablated species hardly depend on oxygen background pressure, are compared. Our results show that the interface between LaAlO3 and SrTiO3 is sharper when the oxygen pressure is lower. Over time, the formation of various crystalline phases is observed while the crystalline thickness of the LaAlO3 layer remains unchanged. X-ray scattering as well as atomic force microscopy measurements indicate three-dimensional growth of such phases, which appear to be fed from an amorphous capping layer present in as-grown samples.
dc.publisherAIP Publishing
dc.relation.urlhttp://scitation.aip.org/content/aip/journal/apl/104/8/10.1063/1.4866439
dc.relation.urlhttp://arxiv.org/abs/1410.2492
dc.rightsArchived with thanks to Applied Physics Letters
dc.titleInfluence of oxygen pressure and aging on LaAlO3 films grown by pulsed laser deposition on SrTiO3 substrates
dc.typeArticle
dc.contributor.departmentMaterials Science and Engineering Program
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Division
dc.identifier.journalApplied Physics Letters
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionLondon Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom
dc.contributor.institutionLondon Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom
dc.contributor.institutionLondon Centre for Nanotechnology, University College London, London WC1H 0AH, United Kingdom
dc.contributor.institutionDivision of Physics and Applied Physics, Nanyang Technological University, Singapore 637371
dc.contributor.institutionDivision of Physics and Applied Physics, Nanyang Technological University, Singapore 637371
dc.contributor.institutionDepartment of Materials, Imperial College London, London SW7 2AZ, United Kingdom
dc.identifier.arxividarXiv:1410.2492
kaust.personWu, Tao
refterms.dateFOA2018-06-14T07:32:48Z
dc.date.posted2014-10-09


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