Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers
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2014_MEE_Suitable photoresist for two-photon polymerization using femtosecond fiber lasers.pdf
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Rajamanickam, V.P.Ferrara, L.
Toma, A.
Proietti Zaccaria, R.
Das, G.
Di Fabrizio, Enzo M.

Liberale, Carlo

KAUST Department
Biological and Environmental Sciences and Engineering (BESE) DivisionBioscience Program
Label-Free Optical Microscopy for Biology Lab
Material Science and Engineering Program
Physical Science and Engineering (PSE) Division
Date
2014-06Permanent link to this record
http://hdl.handle.net/10754/543734
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We present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.Citation
Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers 2014, 121:135 Microelectronic EngineeringPublisher
Elsevier BVJournal
Microelectronic EngineeringAdditional Links
http://linkinghub.elsevier.com/retrieve/pii/S0167931714001877ae974a485f413a2113503eed53cd6c53
10.1016/j.mee.2014.04.040