Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers
Proietti Zaccaria, R.
Di Fabrizio, Enzo M.
KAUST DepartmentBiological and Environmental Sciences and Engineering (BESE) Division
Materials Science and Engineering Program
Physical Sciences and Engineering (PSE) Division
Permanent link to this recordhttp://hdl.handle.net/10754/543734
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AbstractWe present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.
CitationSuitable photo-resists for two-photon polymerization using femtosecond fiber lasers 2014, 121:135 Microelectronic Engineering