KAUST DepartmentIntegrated Nanotechnology Lab
Permanent link to this recordhttp://hdl.handle.net/10754/346750
MetadataShow full item record
AbstractWe discuss the physics of conventional channel material (silicon/germanium hetero-structure) based transistor topology mainly core/shell (inner/outer) gated nanotube vs. gate-all-around nanowire architecture for tunnel field effect transistor application. We show that nanotube topology can result in higher performance through higher normalized current when compared to nanowire architecture at Vdd-=-1-V due to the availability of larger tunneling cross section and lower Shockley-Reed-Hall recombination. Both architectures are able to achieve sub 60-mV/dec performance for more than five orders of magnitude of drain current. This enables the nanotube configuration achieving performance same as the nanowire architecture even when Vdd is scaled down to 0.5-V.
CitationSi/Ge hetero-structure nanotube tunnel field effect transistor 2015, 117 (1):014310 Journal of Applied Physics
JournalJournal of Applied Physics