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Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching

dc.contributor.authorYabiku, Y.
dc.contributor.authorKubo, S.
dc.contributor.authorNakagawa, M.
dc.contributor.authorVacha, M.
dc.contributor.authorHabuchi, Satoshi
dc.date.accessioned2014-11-11T14:28:33Z
dc.date.available2014-11-11T14:28:33Z
dc.date.issued2013-10-23
dc.identifier.citationYabiku Y, Kubo S, Nakagawa M, Vacha M, Habuchi S (2013) Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching. AIP Advances 3: 102128. doi:10.1063/1.4827155.
dc.identifier.issn21583226
dc.identifier.doi10.1063/1.4827155
dc.identifier.urihttp://hdl.handle.net/10754/334529
dc.description.abstractWe applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns. 2013 Author(s).
dc.language.isoen
dc.publisherAIP Publishing
dc.rightsAll article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
dc.rightsArchived with thanks to AIP Advances
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/
dc.subjectFluorescence imaging
dc.subjectFluorescent dyes
dc.subjectNanoscale structure
dc.subjectPolymer nanostructures
dc.subjectPolymer patterns
dc.subjectPolymer thin films
dc.subjectResidual polymers
dc.subjectSelective adsorption
dc.subjectAdsorption
dc.subjectFluorescence
dc.subjectFluorophores
dc.subjectImage resolution
dc.subjectNanoimprint lithography
dc.subjectPhotoresists
dc.subjectPolymers
dc.titleSuper-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching
dc.typeArticle
dc.contributor.departmentBiological and Environmental Sciences and Engineering (BESE) Division
dc.contributor.departmentBioscience Program
dc.contributor.departmentSingle-Molecule Spectroscopy and Microscopy Research Group
dc.identifier.journalAIP Advances
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionDepartment of Organic and Polymeric Materials, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro, Tokyo 152-8552, Japan
dc.contributor.institutionPolymer Hybrid Materials Research Center, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personHabuchi, Satoshi
refterms.dateFOA2018-06-13T15:45:14Z
dc.date.published-online2013-10-23
dc.date.published-print2013-10


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All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
Except where otherwise noted, this item's license is described as All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.