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dc.contributor.authorShen, Chao
dc.contributor.authorCao, Ronggen
dc.contributor.authorCheng, Yingchun
dc.contributor.authorDing, Fei
dc.contributor.authorHuang, Gaoshan
dc.contributor.authorMei, Yongfeng
dc.contributor.authorSchwingenschlögl, Udo
dc.date.accessioned2014-04-13T13:03:30Z
dc.date.available2014-04-13T13:03:30Z
dc.date.issued2012-06-01
dc.identifier.citationShen C, Huang G, Cheng Y, Cao R, Ding F, et al. (2012) Thinning and functionalization of few-layer graphene sheets by CF4 plasma treatment. Nanoscale Research Letters 7: 268. doi:10.1186/1556-276X-7-268.
dc.identifier.issn1556-276X
dc.identifier.pmid22625875
dc.identifier.doi10.1186/1556-276X-7-268
dc.identifier.urihttp://hdl.handle.net/10754/315760
dc.description.abstractStructural changes of few-layer graphene sheets induced by CF4 plasma treatment are studied by optical microscopy and Raman spectroscopy, together with theoretical simulation. Experimental results suggest a thickness reduction of few-layer graphene sheets subjected to prolonged CF4 plasma treatment while plasma treatment with short time only leads to fluorine functionalization on the surface layer by formation of covalent bonds. Raman spectra reveal an increase in disorder by physical disruption of the graphene lattice as well as functionalization during the plasma treatment. The F/CF3 adsorption and the lattice distortion produced are proved by theoretical simulation using density functional theory, which also predicts p-type doping and Dirac cone splitting in CF4 plasma-treated graphene sheets that may have potential in future graphene-based micro/nanodevices.
dc.language.isoen
dc.publisherSpringer Nature
dc.relation.urlhttp://www.nanoscalereslett.com/content/7/1/268
dc.rightsArchived with thanks to Nanoscale Research Letters
dc.subjectGraphene sheets
dc.subjectPlasma
dc.subjectThinning
dc.subjectFunctionalization
dc.subjectRaman spectroscopy
dc.subjectDensity functional theory
dc.subjectDirac cone splitting
dc.titleThinning and functionalization of few-layer graphene sheets by CF4 plasma treatment
dc.typeArticle
dc.contributor.departmentComputational Physics and Materials Science (CPMS)
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalNanoscale Research Letters
dc.identifier.pmcidPMC3458992
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionDepartment of Materials Science, Fudan University, Shanghai 200433, China
dc.contributor.institutionIBM Research-Zürich, Säumerstrasse 4, Rüschlikon CH-8803, Switzerland
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personCheng, Yingchun
kaust.personSchwingenschlögl, Udo
refterms.dateFOA2018-06-13T14:12:46Z
dc.date.published-online2012-06-01
dc.date.published-print2012


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