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dc.contributor.authorKhan, Yasser
dc.contributor.authorAl-Falih, Hisham
dc.contributor.authorNg, Tien Khee
dc.contributor.authorOoi, Boon S.
dc.contributor.authorZhang, Yaping
dc.date.accessioned2014-02-17T04:56:20Z
dc.date.available2014-02-17T04:56:20Z
dc.date.issued2012-06-22
dc.identifier.citationKhan Y, Al-Falih H, Zhang Y, Ng TK, Ooi BS (2012) Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips. Review of Scientific Instruments 83: 063708. doi:10.1063/1.4730045.
dc.identifier.issn00346748
dc.identifier.pmid22755635
dc.identifier.doi10.1063/1.4730045
dc.identifier.urihttp://hdl.handle.net/10754/312975
dc.description.abstractDynamic electrochemical etching technique is optimized to produce tungsten tips with controllable shape and radius of curvature of less than 10 nm. Nascent features such as dynamic electrochemical etching and reverse biasing after drop-off are utilized, and two-step dynamic electrochemical etching is introduced to produce extremely sharp tips with controllable aspect ratio. Electronic current shut-off time for conventional dc drop-off technique is reduced to ?36 ns using high speed analog electronics. Undesirable variability in tip shape, which is innate to static dc electrochemical etching, is mitigated with novel dynamic electrochemical etching. Overall, we present a facile and robust approach, whereby using a novel etchant level adjustment mechanism, 30° variability in cone angle and 1.5 mm controllability in cone length were achieved, while routinely producing ultra-sharp probes. © 2012 American Institute of Physics.
dc.language.isoen
dc.publisherAIP Publishing
dc.relation.urlhttp://link.aip.org/link/RSINAK/v83/i6/p063708/s1&Agg=doi
dc.rightsArchived with thanks to Review of Scientific Instruments
dc.titleTwo-step controllable electrochemical etching of tungsten scanning probe microscopy tips
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentPhotonics Laboratory
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Division
dc.identifier.journalReview of Scientific Instruments
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionCenter for Photonic and Multiscale Nanomaterials, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI 48109, United States
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personKhan, Yasser
kaust.personNg, Tien Khee
kaust.personOoi, Boon S.
kaust.personAl-Falih, Hisham
kaust.personZhang, Yaping
refterms.dateFOA2018-06-14T04:17:14Z
dc.date.published-online2012-06-22
dc.date.published-print2012-06


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