Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips
Type
ArticleKAUST Department
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) DivisionElectrical Engineering Program
Photonics Laboratory
Physical Science and Engineering (PSE) Division
Date
2012-06-22Online Publication Date
2012-06-22Print Publication Date
2012-06Permanent link to this record
http://hdl.handle.net/10754/312975
Metadata
Show full item recordAbstract
Dynamic electrochemical etching technique is optimized to produce tungsten tips with controllable shape and radius of curvature of less than 10 nm. Nascent features such as dynamic electrochemical etching and reverse biasing after drop-off are utilized, and two-step dynamic electrochemical etching is introduced to produce extremely sharp tips with controllable aspect ratio. Electronic current shut-off time for conventional dc drop-off technique is reduced to ?36 ns using high speed analog electronics. Undesirable variability in tip shape, which is innate to static dc electrochemical etching, is mitigated with novel dynamic electrochemical etching. Overall, we present a facile and robust approach, whereby using a novel etchant level adjustment mechanism, 30° variability in cone angle and 1.5 mm controllability in cone length were achieved, while routinely producing ultra-sharp probes. © 2012 American Institute of Physics.Citation
Khan Y, Al-Falih H, Zhang Y, Ng TK, Ooi BS (2012) Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips. Review of Scientific Instruments 83: 063708. doi:10.1063/1.4730045.Publisher
AIP PublishingJournal
Review of Scientific InstrumentsPubMed ID
22755635Additional Links
http://link.aip.org/link/RSINAK/v83/i6/p063708/s1&Agg=doiae974a485f413a2113503eed53cd6c53
10.1063/1.4730045
Scopus Count
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