III-nitrides, 2D transition metal dichalcogenides, and their heterojunctions

Handle URI:
http://hdl.handle.net/10754/623463
Title:
III-nitrides, 2D transition metal dichalcogenides, and their heterojunctions
Authors:
Mishra, Pawan ( 0000-0001-9764-6016 )
Abstract:
Group III-nitride materials have attracted great attention for applications in high efficiency electronic and optoelectronics devices such as high electron mobility transistors, light emitting diodes, and laser diodes. On the other hand, group VI transition metal dichalcogenides (TMDs) in the form of MX2 has recently emerged as a novel atomic layered material system with excellent thermoelectric, electronic and optoelectronic properties. Also, the recent investigations reveal that the dissimilar heterojunctions formed by TMDs and III-nitrides provide the route for novel devices in the area of optoelectronic, electronics, and water splitting applications. In addition, integration of III-nitrides and TMDs will enable high density integrated optoelectronic circuits and the development of hybrid integration technologies. In this work, we have demonstrated kinetically controlled growth processes in plasma assisted molecular beam epitaxy (PAMBE) for the III-nitrides and their engineered heterostructures. Techniques such as Ga irradiation and nitrogen plasma exposure has been utilized to implement bulk GaN, InGaN and their heterostructures in PAMBE. For the growth of III-nitride based heterostructures, the in-situ surface stoichiometry monitoring (i-SSM) technique was developed and used for implementing stepped and compositionally graded InGaN-based multiple quantum wells (MQWs). Their optical and microstrain analysis in conjunction with theoretical studies confirmed improvement in the radiative recombination rate of the graded-MQWs as compared to that of stepped-MQWs, owing to the reduced strain in graded-MQWs. Our achievement also includes the realization of the p-type MoS2 by engineering pristine MoS2 layers in PAMBE. Mainly, Ga and nitrogen plasma irradiation on the pristine MoS2 in PAMBE has resulted in the realization of the p-type MoS2. Also, GaN epitaxial thin layers were deposited on MoS2/c-sapphire, WSe2/c-sapphire substrates by PAMBE to study the band discontinuity at GaN/TMDs heterointerface. The determination of band offset parameters for both GaN/MoS2 and GaN/WSe2 heterostructures revealed realization of type-II band alignment. Also, heterojunctions such as AlGaN/MoS2 is implemented to achieve type-I heterojunction. This work may open up a new avenue towards photonic quantum devices based on the integration of III-nitrides with 2D TMDs.
Advisors:
Ooi, Boon S. ( 0000-0001-9606-5578 )
Committee Member:
Ohkawa, Kazuhiro; Zhang, Xixiang ( 0000-0002-3478-6414 ) ; Grandjean, Nicolas
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Program:
Electrical Engineering
Issue Date:
Apr-2017
Type:
Dissertation
Appears in Collections:
Dissertations

Full metadata record

DC FieldValue Language
dc.contributor.advisorOoi, Boon S.en
dc.contributor.authorMishra, Pawanen
dc.date.accessioned2017-05-10T08:33:59Z-
dc.date.available2017-05-10T08:33:59Z-
dc.date.issued2017-04-
dc.identifier.urihttp://hdl.handle.net/10754/623463-
dc.description.abstractGroup III-nitride materials have attracted great attention for applications in high efficiency electronic and optoelectronics devices such as high electron mobility transistors, light emitting diodes, and laser diodes. On the other hand, group VI transition metal dichalcogenides (TMDs) in the form of MX2 has recently emerged as a novel atomic layered material system with excellent thermoelectric, electronic and optoelectronic properties. Also, the recent investigations reveal that the dissimilar heterojunctions formed by TMDs and III-nitrides provide the route for novel devices in the area of optoelectronic, electronics, and water splitting applications. In addition, integration of III-nitrides and TMDs will enable high density integrated optoelectronic circuits and the development of hybrid integration technologies. In this work, we have demonstrated kinetically controlled growth processes in plasma assisted molecular beam epitaxy (PAMBE) for the III-nitrides and their engineered heterostructures. Techniques such as Ga irradiation and nitrogen plasma exposure has been utilized to implement bulk GaN, InGaN and their heterostructures in PAMBE. For the growth of III-nitride based heterostructures, the in-situ surface stoichiometry monitoring (i-SSM) technique was developed and used for implementing stepped and compositionally graded InGaN-based multiple quantum wells (MQWs). Their optical and microstrain analysis in conjunction with theoretical studies confirmed improvement in the radiative recombination rate of the graded-MQWs as compared to that of stepped-MQWs, owing to the reduced strain in graded-MQWs. Our achievement also includes the realization of the p-type MoS2 by engineering pristine MoS2 layers in PAMBE. Mainly, Ga and nitrogen plasma irradiation on the pristine MoS2 in PAMBE has resulted in the realization of the p-type MoS2. Also, GaN epitaxial thin layers were deposited on MoS2/c-sapphire, WSe2/c-sapphire substrates by PAMBE to study the band discontinuity at GaN/TMDs heterointerface. The determination of band offset parameters for both GaN/MoS2 and GaN/WSe2 heterostructures revealed realization of type-II band alignment. Also, heterojunctions such as AlGaN/MoS2 is implemented to achieve type-I heterojunction. This work may open up a new avenue towards photonic quantum devices based on the integration of III-nitrides with 2D TMDs.en
dc.language.isoenen
dc.subjectMolecular Beam Epitaxyen
dc.subjectIII-nitridesen
dc.subject2D TMDsen
dc.subject3D/2d Heterojunctionsen
dc.titleIII-nitrides, 2D transition metal dichalcogenides, and their heterojunctionsen
dc.typeDissertationen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
thesis.degree.grantorKing Abdullah University of Science and Technologyen_GB
dc.contributor.committeememberOhkawa, Kazuhiroen
dc.contributor.committeememberZhang, Xixiangen
dc.contributor.committeememberGrandjean, Nicolasen
thesis.degree.disciplineElectrical Engineeringen
thesis.degree.nameDoctor of Philosophyen
dc.person.id124233en
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