CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors

Handle URI:
http://hdl.handle.net/10754/623223
Title:
CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors
Authors:
Wei, Binbin; Liang, Hanfeng; Zhang, Dongfang; Wu, Zhengtao; Qi, Zhengbing; Wang, Zhoucheng
Abstract:
Supercapacitors have been becoming indispensable energy storage devices in micro-electromechanical systems and have been widely studied over the past few decades. Transition metal nitrides with excellent electrical conductivity and superior cycling stability are promising candidates as supercapacitor electrode materials. In this work, we report the fabrication of CrN thin films using reactive DC magnetron sputtering and further their applications for symmetric supercapacitors for the first time. The CrN thin film electrodes fabricated under the deposition pressure of 3.5 Pa show an areal specific capacitance of 12.8 mF cm at 1.0 mA cm and high cycling stability with 92.1% capacitance retention after 20 000 cycles in a 0.5 M HSO electrolyte. Furthermore, our developed CrN//CrN symmetric supercapacitor can deliver a high energy density of 8.2 mW h cm at the power density of 0.7 W cm along with outstanding cycling stability. Thus, the CrN thin films have great potential for application in supercapacitors and other energy storage systems.
KAUST Department:
Materials Science and Engineering Program
Citation:
Wei B, Liang H, Zhang D, Wu Z, Qi Z, et al. (2017) CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors. J Mater Chem A 5: 2844–2851. Available: http://dx.doi.org/10.1039/c6ta09985h.
Publisher:
Royal Society of Chemistry (RSC)
Journal:
J. Mater. Chem. A
Issue Date:
29-Dec-2016
DOI:
10.1039/c6ta09985h
Type:
Article
ISSN:
2050-7488; 2050-7496
Sponsors:
This work was financially supported by the National Nature Science Foundation of China (No. 51372212).
Additional Links:
http://pubs.rsc.org/en/Content/ArticleLanding/2017/TA/C6TA09985H
Appears in Collections:
Articles; Materials Science and Engineering Program

Full metadata record

DC FieldValue Language
dc.contributor.authorWei, Binbinen
dc.contributor.authorLiang, Hanfengen
dc.contributor.authorZhang, Dongfangen
dc.contributor.authorWu, Zhengtaoen
dc.contributor.authorQi, Zhengbingen
dc.contributor.authorWang, Zhouchengen
dc.date.accessioned2017-04-15T11:15:45Z-
dc.date.available2017-04-15T11:15:45Z-
dc.date.issued2016-12-29en
dc.identifier.citationWei B, Liang H, Zhang D, Wu Z, Qi Z, et al. (2017) CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors. J Mater Chem A 5: 2844–2851. Available: http://dx.doi.org/10.1039/c6ta09985h.en
dc.identifier.issn2050-7488en
dc.identifier.issn2050-7496en
dc.identifier.doi10.1039/c6ta09985hen
dc.identifier.urihttp://hdl.handle.net/10754/623223-
dc.description.abstractSupercapacitors have been becoming indispensable energy storage devices in micro-electromechanical systems and have been widely studied over the past few decades. Transition metal nitrides with excellent electrical conductivity and superior cycling stability are promising candidates as supercapacitor electrode materials. In this work, we report the fabrication of CrN thin films using reactive DC magnetron sputtering and further their applications for symmetric supercapacitors for the first time. The CrN thin film electrodes fabricated under the deposition pressure of 3.5 Pa show an areal specific capacitance of 12.8 mF cm at 1.0 mA cm and high cycling stability with 92.1% capacitance retention after 20 000 cycles in a 0.5 M HSO electrolyte. Furthermore, our developed CrN//CrN symmetric supercapacitor can deliver a high energy density of 8.2 mW h cm at the power density of 0.7 W cm along with outstanding cycling stability. Thus, the CrN thin films have great potential for application in supercapacitors and other energy storage systems.en
dc.description.sponsorshipThis work was financially supported by the National Nature Science Foundation of China (No. 51372212).en
dc.publisherRoyal Society of Chemistry (RSC)en
dc.relation.urlhttp://pubs.rsc.org/en/Content/ArticleLanding/2017/TA/C6TA09985Hen
dc.titleCrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitorsen
dc.typeArticleen
dc.contributor.departmentMaterials Science and Engineering Programen
dc.identifier.journalJ. Mater. Chem. Aen
dc.contributor.institutionDepartment of Chemical and Biochemical Engineering, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, Chinaen
dc.contributor.institutionCollege of Materials Science and Engineering, Xiamen University of Technology, Xiamen, 361024, Chinaen
kaust.authorLiang, Hanfengen
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