Performance enhancement of electronic sensor through mask-less lithography

Handle URI:
http://hdl.handle.net/10754/622584
Title:
Performance enhancement of electronic sensor through mask-less lithography
Authors:
Nag, Anindya; Zia, Asif I.; Mukhopadhyay, S. C.; Kosel, Jürgen ( 0000-0002-8998-8275 )
Abstract:
The escalating applications of miniaturized sensors have led the microelectronics industry to stay abreast with the precise micro-fabrication technologies. The following article describes a new technique for the fabrication of miniaturized interdigitated capacitive sensors that own highly sensitive and real-time detections capabilities. In standard lithographic procedure, the sensors are fabricated applying different photoresist materials that give rise to the variable characteristic profile of the fabricated product. Single crystal p-doped Silicon wafer was used as a substrate material due to its advantageous properties over Germanium. Heidelberg system was used for the maskless lithographic patterning of the new interdigital sensors on a silicon substrate. The process was carried out in a clean room in the absence of ultraviolet light at a fixed temperature. The fabricated sensors were used for inflammable gas sensing application. Electrochemical Impedance Spectroscopy was applied to read the resistive and capacitive impedance measured by the sensor. The results proclaimed that the fabricated sensors own better performance in LPG detection as compared to its commercial counterparts.
KAUST Department:
Sensing, Magnetism and Microsystems Lab
Citation:
Nag A, Zia AI, Mukhopadhyay SC, Kosel J (2015) Performance enhancement of electronic sensor through mask-less lithography. 2015 9th International Conference on Sensing Technology (ICST). Available: http://dx.doi.org/10.1109/ICSensT.2015.7438426.
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)
Journal:
2015 9th International Conference on Sensing Technology (ICST)
Conference/Event name:
9th International Conference on Sensing Technology, ICST 2015
Issue Date:
30-Mar-2016
DOI:
10.1109/ICSensT.2015.7438426
Type:
Conference Paper
Appears in Collections:
Conference Papers; Sensing, Magnetism and Microsystems Lab

Full metadata record

DC FieldValue Language
dc.contributor.authorNag, Anindyaen
dc.contributor.authorZia, Asif I.en
dc.contributor.authorMukhopadhyay, S. C.en
dc.contributor.authorKosel, Jürgenen
dc.date.accessioned2017-01-02T09:55:31Z-
dc.date.available2017-01-02T09:55:31Z-
dc.date.issued2016-03-30en
dc.identifier.citationNag A, Zia AI, Mukhopadhyay SC, Kosel J (2015) Performance enhancement of electronic sensor through mask-less lithography. 2015 9th International Conference on Sensing Technology (ICST). Available: http://dx.doi.org/10.1109/ICSensT.2015.7438426.en
dc.identifier.doi10.1109/ICSensT.2015.7438426en
dc.identifier.urihttp://hdl.handle.net/10754/622584-
dc.description.abstractThe escalating applications of miniaturized sensors have led the microelectronics industry to stay abreast with the precise micro-fabrication technologies. The following article describes a new technique for the fabrication of miniaturized interdigitated capacitive sensors that own highly sensitive and real-time detections capabilities. In standard lithographic procedure, the sensors are fabricated applying different photoresist materials that give rise to the variable characteristic profile of the fabricated product. Single crystal p-doped Silicon wafer was used as a substrate material due to its advantageous properties over Germanium. Heidelberg system was used for the maskless lithographic patterning of the new interdigital sensors on a silicon substrate. The process was carried out in a clean room in the absence of ultraviolet light at a fixed temperature. The fabricated sensors were used for inflammable gas sensing application. Electrochemical Impedance Spectroscopy was applied to read the resistive and capacitive impedance measured by the sensor. The results proclaimed that the fabricated sensors own better performance in LPG detection as compared to its commercial counterparts.en
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en
dc.subjectablationen
dc.subjectMaskless Lithographyen
dc.subjectphotoresisten
dc.subjectsilicon wafersen
dc.subjectsputteringen
dc.subjectwire bondingen
dc.titlePerformance enhancement of electronic sensor through mask-less lithographyen
dc.typeConference Paperen
dc.contributor.departmentSensing, Magnetism and Microsystems Laben
dc.identifier.journal2015 9th International Conference on Sensing Technology (ICST)en
dc.conference.date2015-12-08 to 2015-12-11en
dc.conference.name9th International Conference on Sensing Technology, ICST 2015en
dc.conference.locationAuckland, NZLen
dc.contributor.institutionSchool of Engineering and Advanced Technology, Massey University (Manawatu Campus), Palmerston North, New Zealanden
kaust.authorKosel, Jürgenen
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