High efficiency on-chip Dielectric Resonator Antennna using micromachining technology

Handle URI:
http://hdl.handle.net/10754/621252
Title:
High efficiency on-chip Dielectric Resonator Antennna using micromachining technology
Authors:
Sallam, Mai O.; Serry, Mohamed; Shamim, Atif ( 0000-0002-4207-4740 ) ; De Raedt, Walter; Sedky, Sherif; Vandenbosch, Guy A. E.; Soliman, Ezzeldin A.
Abstract:
In this paper, a novel cylindrical Dielectric Resonator Antenna (DRA) operating at 60 GHz is introduced. The antenna is fabricated using a high-resistivity silicon wafer. The DR is defined in the wafer using micromachining technology. The feeding network is located at the other side of the wafer. The proposed antenna is simulated using HFSS and the results are verified by measurements. The antenna radiation is mainly along the broadside direction. The measured gain, radiation efficiency, and bandwidth are 7 dBi, 74.65%, and 2.23 GHz respectively. The antenna is characterized by high polarization purity where the maximum cross-polarization is -15 dB. © 2015 IEEE.
KAUST Department:
King Abdullah University of Science and Technology, Thuwal, Saudi Arabia
Citation:
Sallam MO, Serry M, Shamim A, De Raedt W, Sedky S, et al. (2015) High efficiency on-chip Dielectric Resonator Antennna using micromachining technology. 2015 IEEE International Symposium on Antennas and Propagation & USNC/URSI National Radio Science Meeting. Available: http://dx.doi.org/10.1109/APS.2015.7304613.
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)
Journal:
2015 IEEE International Symposium on Antennas and Propagation & USNC/URSI National Radio Science Meeting
Conference/Event name:
IEEE Antennas and Propagation Society International Symposium, APS 2015
Issue Date:
26-Oct-2015
DOI:
10.1109/APS.2015.7304613
Type:
Conference Paper
Additional Links:
http://ieeexplore.ieee.org/document/7304613
Appears in Collections:
Conference Papers

Full metadata record

DC FieldValue Language
dc.contributor.authorSallam, Mai O.en
dc.contributor.authorSerry, Mohameden
dc.contributor.authorShamim, Atifen
dc.contributor.authorDe Raedt, Walteren
dc.contributor.authorSedky, Sherifen
dc.contributor.authorVandenbosch, Guy A. E.en
dc.contributor.authorSoliman, Ezzeldin A.en
dc.date.accessioned2016-11-03T06:56:30Z-
dc.date.available2016-11-03T06:56:30Z-
dc.date.issued2015-10-26en
dc.identifier.citationSallam MO, Serry M, Shamim A, De Raedt W, Sedky S, et al. (2015) High efficiency on-chip Dielectric Resonator Antennna using micromachining technology. 2015 IEEE International Symposium on Antennas and Propagation & USNC/URSI National Radio Science Meeting. Available: http://dx.doi.org/10.1109/APS.2015.7304613.en
dc.identifier.doi10.1109/APS.2015.7304613en
dc.identifier.urihttp://hdl.handle.net/10754/621252-
dc.description.abstractIn this paper, a novel cylindrical Dielectric Resonator Antenna (DRA) operating at 60 GHz is introduced. The antenna is fabricated using a high-resistivity silicon wafer. The DR is defined in the wafer using micromachining technology. The feeding network is located at the other side of the wafer. The proposed antenna is simulated using HFSS and the results are verified by measurements. The antenna radiation is mainly along the broadside direction. The measured gain, radiation efficiency, and bandwidth are 7 dBi, 74.65%, and 2.23 GHz respectively. The antenna is characterized by high polarization purity where the maximum cross-polarization is -15 dB. © 2015 IEEE.en
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en
dc.relation.urlhttp://ieeexplore.ieee.org/document/7304613en
dc.titleHigh efficiency on-chip Dielectric Resonator Antennna using micromachining technologyen
dc.typeConference Paperen
dc.contributor.departmentKing Abdullah University of Science and Technology, Thuwal, Saudi Arabiaen
dc.identifier.journal2015 IEEE International Symposium on Antennas and Propagation & USNC/URSI National Radio Science Meetingen
dc.conference.date19 July 2015 through 24 July 2015en
dc.conference.nameIEEE Antennas and Propagation Society International Symposium, APS 2015en
dc.contributor.institutionAmerican University in Cairo, AUC Avenue, P. O. Box 74, New Cairo, Egypten
dc.contributor.institutionIMEC, Kapeldreef 75, Leuven, Belgiumen
dc.contributor.institutionZewail City, Giza, Egypten
dc.contributor.institutionKU Leuven, ESAT-TELEMIC, Kasteelpark Arenberg 10, Leuven, Belgiumen
kaust.authorShamim, Atifen
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