Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate

Handle URI:
http://hdl.handle.net/10754/600179
Title:
Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate
Authors:
Morber, Jenny Ruth; Wang, Xudong; Liu, Jin; Snyder, Robert L.; Wang, Zhong Lin
Abstract:
A study was conducted to fabricate wafer-level patterned and aligned polymer nanowire (PNW), micro- and nanotube arrays (PNT), which were created by exposing the polymer material to plasma etching. The approach for producing wafer-level aligned PNWs involved a one-step inductively coupled plasma (ICP) reactive ion etching process. The polymer nanowire array was fabricated in an ICP reactive ion milling chamber with a pressure of 10mTorr. Argon (Ar), O 2, and CF4 gases were released into the chamber as etchants at flow rates of 15 sccm, 10 sccm, and 40 sccm. Inert gasses, such as Ar-form positive ions were incorporated to serve as a physical component to assist in the material degradation process. One power source (400 W) was used to generate dense plasma from the input gases, while another power source applied a voltage of approximately 600V to accelerate the plasma toward the substrate.
Citation:
Morber JR, Wang X, Liu J, Snyder RL, Wang ZL (2009) Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate. Advanced Materials 21: 2072–2076. Available: http://dx.doi.org/10.1002/adma.200803648.
Publisher:
Wiley-Blackwell
Journal:
Advanced Materials
Issue Date:
25-May-2009
DOI:
10.1002/adma.200803648
Type:
Article
ISSN:
0935-9648; 1521-4095
Sponsors:
Research supported by DARPA (Army/AMCOM/REDSTONE AR, W31P4Q-08-1-0009), BES DOE (DE-FG02-07ER46394), Air Force Office (FA9550-08-1-0446), and KAUST Global Research Partnership. We would like to thank Polysciences, Inc. for their generous contribution of PVDF polymer. Thanks to Prof. C. P. Wong and Rongwei Zhang for assistance in acquiring the FTIR data. Supporting Information is available online from Wiley InterScience or from the author.
Appears in Collections:
Publications Acknowledging KAUST Support

Full metadata record

DC FieldValue Language
dc.contributor.authorMorber, Jenny Ruthen
dc.contributor.authorWang, Xudongen
dc.contributor.authorLiu, Jinen
dc.contributor.authorSnyder, Robert L.en
dc.contributor.authorWang, Zhong Linen
dc.date.accessioned2016-02-28T06:44:32Zen
dc.date.available2016-02-28T06:44:32Zen
dc.date.issued2009-05-25en
dc.identifier.citationMorber JR, Wang X, Liu J, Snyder RL, Wang ZL (2009) Wafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrate. Advanced Materials 21: 2072–2076. Available: http://dx.doi.org/10.1002/adma.200803648.en
dc.identifier.issn0935-9648en
dc.identifier.issn1521-4095en
dc.identifier.doi10.1002/adma.200803648en
dc.identifier.urihttp://hdl.handle.net/10754/600179en
dc.description.abstractA study was conducted to fabricate wafer-level patterned and aligned polymer nanowire (PNW), micro- and nanotube arrays (PNT), which were created by exposing the polymer material to plasma etching. The approach for producing wafer-level aligned PNWs involved a one-step inductively coupled plasma (ICP) reactive ion etching process. The polymer nanowire array was fabricated in an ICP reactive ion milling chamber with a pressure of 10mTorr. Argon (Ar), O 2, and CF4 gases were released into the chamber as etchants at flow rates of 15 sccm, 10 sccm, and 40 sccm. Inert gasses, such as Ar-form positive ions were incorporated to serve as a physical component to assist in the material degradation process. One power source (400 W) was used to generate dense plasma from the input gases, while another power source applied a voltage of approximately 600V to accelerate the plasma toward the substrate.en
dc.description.sponsorshipResearch supported by DARPA (Army/AMCOM/REDSTONE AR, W31P4Q-08-1-0009), BES DOE (DE-FG02-07ER46394), Air Force Office (FA9550-08-1-0446), and KAUST Global Research Partnership. We would like to thank Polysciences, Inc. for their generous contribution of PVDF polymer. Thanks to Prof. C. P. Wong and Rongwei Zhang for assistance in acquiring the FTIR data. Supporting Information is available online from Wiley InterScience or from the author.en
dc.publisherWiley-Blackwellen
dc.titleWafer-Level Patterned and Aligned Polymer Nanowire/Micro- and Nanotube Arrays on any Substrateen
dc.typeArticleen
dc.identifier.journalAdvanced Materialsen
dc.contributor.institutionGeorgia Institute of Technology, Atlanta, United Statesen
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