Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors

Handle URI:
http://hdl.handle.net/10754/600157
Title:
Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors
Authors:
Lee, Daeho; Paeng, Dongwoo; Park, Hee K.; Grigoropoulos, Costas P.
Abstract:
© 2014 American Chemical Society. We introduce a method for direct patterning of Ni electrodes through selective laser direct writing (LDW) of NiO nanoparticle (NP) ink. High-resolution Ni patterns are generated from NiO NP thin films by a vacuum-free, lithography-free, and solution-processable route. In particular, a continuous wave laser is used for the LDW reductive sintering of the metal oxide under ambient conditions with the aid of reducing agents in the ink solvent. Thin (∼40 nm) Ni electrodes of glossy metallic surfaces with smooth morphology and excellent edge definition can be fabricated. By applying this method, we demonstrate a high transmittance (>87%), electrically conducting panel for a touch screen panel application. The resistivity of the Ni electrode is less than an order of magnitude higher compared to that of the bulk Ni. Mechanical bending test, tape-pull test, and ultrasonic bath test confirm the robust adhesion of the electrodes on glass and polymer substrates.
Citation:
Lee D, Paeng D, Park HK, Grigoropoulos CP (2014) Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors. ACS Nano 8: 9807–9814. Available: http://dx.doi.org/10.1021/nn503383z.
Publisher:
American Chemical Society (ACS)
Journal:
ACS Nano
Issue Date:
28-Oct-2014
DOI:
10.1021/nn503383z
PubMed ID:
25130917
Type:
Article
ISSN:
1936-0851; 1936-086X
Sponsors:
Partial support to the Laser Thermal Laboratory by the King Abdullah University of Science and Technology (KAUST) is acknowledged. Laser Prismatics LLC was supported by the SBIR Phase I Grant No. 1346088 from the U.S. National Science Foundation. D.L. was supported by Gachon University research fund of 2014(GCU-2014-0107). The authors also would like to thank Dr. Frances I. Allen (Lawrence Berkeley National Lab) for assistance in recording TEM images.
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Full metadata record

DC FieldValue Language
dc.contributor.authorLee, Daehoen
dc.contributor.authorPaeng, Dongwooen
dc.contributor.authorPark, Hee K.en
dc.contributor.authorGrigoropoulos, Costas P.en
dc.date.accessioned2016-02-28T06:43:55Zen
dc.date.available2016-02-28T06:43:55Zen
dc.date.issued2014-10-28en
dc.identifier.citationLee D, Paeng D, Park HK, Grigoropoulos CP (2014) Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors. ACS Nano 8: 9807–9814. Available: http://dx.doi.org/10.1021/nn503383z.en
dc.identifier.issn1936-0851en
dc.identifier.issn1936-086Xen
dc.identifier.pmid25130917en
dc.identifier.doi10.1021/nn503383zen
dc.identifier.urihttp://hdl.handle.net/10754/600157en
dc.description.abstract© 2014 American Chemical Society. We introduce a method for direct patterning of Ni electrodes through selective laser direct writing (LDW) of NiO nanoparticle (NP) ink. High-resolution Ni patterns are generated from NiO NP thin films by a vacuum-free, lithography-free, and solution-processable route. In particular, a continuous wave laser is used for the LDW reductive sintering of the metal oxide under ambient conditions with the aid of reducing agents in the ink solvent. Thin (∼40 nm) Ni electrodes of glossy metallic surfaces with smooth morphology and excellent edge definition can be fabricated. By applying this method, we demonstrate a high transmittance (>87%), electrically conducting panel for a touch screen panel application. The resistivity of the Ni electrode is less than an order of magnitude higher compared to that of the bulk Ni. Mechanical bending test, tape-pull test, and ultrasonic bath test confirm the robust adhesion of the electrodes on glass and polymer substrates.en
dc.description.sponsorshipPartial support to the Laser Thermal Laboratory by the King Abdullah University of Science and Technology (KAUST) is acknowledged. Laser Prismatics LLC was supported by the SBIR Phase I Grant No. 1346088 from the U.S. National Science Foundation. D.L. was supported by Gachon University research fund of 2014(GCU-2014-0107). The authors also would like to thank Dr. Frances I. Allen (Lawrence Berkeley National Lab) for assistance in recording TEM images.en
dc.publisherAmerican Chemical Society (ACS)en
dc.subjectflexible substrateen
dc.subjectNi electrodeen
dc.subjectNiO nanoparticle inken
dc.subjectselective laser reductive sinteringen
dc.subjectsolution-processable routeen
dc.subjecttouch screen panelen
dc.titleVacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductorsen
dc.typeArticleen
dc.identifier.journalACS Nanoen
dc.contributor.institutionUC Berkeley, Berkeley, United Statesen
dc.contributor.institutionGachon University, Seongnam-si, Gyeonggi-do, South Koreaen
dc.contributor.institutionLaser Prismatics LLC, , United Statesen
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