The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition

Handle URI:
http://hdl.handle.net/10754/599940
Title:
The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition
Authors:
Wang, Na; Komvopoulos, Kyriakos
Abstract:
The structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) deposition was investigated by high-resolution transmission electron microscopy, electron energy loss spectroscopy, and x-ray photoelectron spectroscopy. Results of the plasmon excitation energy shift and through-thickness elemental concentration show a multilayered a-C film structure comprising an interface layer consisting of C, Si, and, possibly, SiC, a buffer layer with continuously increasing sp 3 fraction, a relatively thicker layer (bulk film) of constant sp 3 content, and an ultrathin surface layer rich in sp 2 hybridization. A detailed study of the C K-edge spectrum indicates that the buffer layer between the interface layer and the bulk film is due to the partial backscattering of C+ ions interacting with the heavy atoms of the silicon substrate. The results of this study provide insight into the minimum thickness of a-C films deposited by FCVA under optimum substrate bias conditions. Copyright © 2013 Materials Research Society.
Citation:
Wang N, Komvopoulos K (2013) The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition. J Mater Res 28: 2124–2131. Available: http://dx.doi.org/10.1557/jmr.2013.206.
Publisher:
Cambridge University Press (CUP)
Journal:
Journal of Materials Research
Issue Date:
Aug-2013
DOI:
10.1557/jmr.2013.206
Type:
Article
ISSN:
0884-2914; 2044-5326
Sponsors:
This research was funded by the Computer Mechanics Laboratory (CML) and the UCB-KAUST Academic Excellence Alliance (AEA) Program. TEM and XPS studies were performed at the National Center for Electron Microscopy and the Molecular Foundry, respectively, of the Lawrence Berkeley National Laboratory.
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Full metadata record

DC FieldValue Language
dc.contributor.authorWang, Naen
dc.contributor.authorKomvopoulos, Kyriakosen
dc.date.accessioned2016-02-28T06:32:54Zen
dc.date.available2016-02-28T06:32:54Zen
dc.date.issued2013-08en
dc.identifier.citationWang N, Komvopoulos K (2013) The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition. J Mater Res 28: 2124–2131. Available: http://dx.doi.org/10.1557/jmr.2013.206.en
dc.identifier.issn0884-2914en
dc.identifier.issn2044-5326en
dc.identifier.doi10.1557/jmr.2013.206en
dc.identifier.urihttp://hdl.handle.net/10754/599940en
dc.description.abstractThe structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) deposition was investigated by high-resolution transmission electron microscopy, electron energy loss spectroscopy, and x-ray photoelectron spectroscopy. Results of the plasmon excitation energy shift and through-thickness elemental concentration show a multilayered a-C film structure comprising an interface layer consisting of C, Si, and, possibly, SiC, a buffer layer with continuously increasing sp 3 fraction, a relatively thicker layer (bulk film) of constant sp 3 content, and an ultrathin surface layer rich in sp 2 hybridization. A detailed study of the C K-edge spectrum indicates that the buffer layer between the interface layer and the bulk film is due to the partial backscattering of C+ ions interacting with the heavy atoms of the silicon substrate. The results of this study provide insight into the minimum thickness of a-C films deposited by FCVA under optimum substrate bias conditions. Copyright © 2013 Materials Research Society.en
dc.description.sponsorshipThis research was funded by the Computer Mechanics Laboratory (CML) and the UCB-KAUST Academic Excellence Alliance (AEA) Program. TEM and XPS studies were performed at the National Center for Electron Microscopy and the Molecular Foundry, respectively, of the Lawrence Berkeley National Laboratory.en
dc.publisherCambridge University Press (CUP)en
dc.titleThe multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc depositionen
dc.typeArticleen
dc.identifier.journalJournal of Materials Researchen
dc.contributor.institutionUC Berkeley, Berkeley, United Statesen
kaust.grant.programAcademic Excellence Alliance (AEA)en
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