Studying the mechanism of hybrid nanoparticle EUV photoresists

Handle URI:
http://hdl.handle.net/10754/599791
Title:
Studying the mechanism of hybrid nanoparticle EUV photoresists
Authors:
Zhang, Ben; Li, Li; Jiang, Jing; Neisser, Mark; Chun, Jun Sung; Ober, Christopher K.; Giannelis, Emmanuel P.
Abstract:
This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation:
Zhang B, Li L, Jiang J, Neisser M, Chun JS, et al. (2015) Studying the mechanism of hybrid nanoparticle EUV photoresists. Advances in Patterning Materials and Processes XXXII. Available: http://dx.doi.org/10.1117/12.2085662.
Publisher:
SPIE-Intl Soc Optical Eng
Journal:
Advances in Patterning Materials and Processes XXXII
Issue Date:
23-Mar-2015
DOI:
10.1117/12.2085662
Type:
Conference Paper
Sponsors:
The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), and the KAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.
Appears in Collections:
Publications Acknowledging KAUST Support

Full metadata record

DC FieldValue Language
dc.contributor.authorZhang, Benen
dc.contributor.authorLi, Lien
dc.contributor.authorJiang, Jingen
dc.contributor.authorNeisser, Marken
dc.contributor.authorChun, Jun Sungen
dc.contributor.authorOber, Christopher K.en
dc.contributor.authorGiannelis, Emmanuel P.en
dc.date.accessioned2016-02-28T06:09:54Zen
dc.date.available2016-02-28T06:09:54Zen
dc.date.issued2015-03-23en
dc.identifier.citationZhang B, Li L, Jiang J, Neisser M, Chun JS, et al. (2015) Studying the mechanism of hybrid nanoparticle EUV photoresists. Advances in Patterning Materials and Processes XXXII. Available: http://dx.doi.org/10.1117/12.2085662.en
dc.identifier.doi10.1117/12.2085662en
dc.identifier.urihttp://hdl.handle.net/10754/599791en
dc.description.abstractThis work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.en
dc.description.sponsorshipThe authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), and the KAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.en
dc.publisherSPIE-Intl Soc Optical Engen
dc.titleStudying the mechanism of hybrid nanoparticle EUV photoresistsen
dc.typeConference Paperen
dc.identifier.journalAdvances in Patterning Materials and Processes XXXIIen
dc.contributor.institutionCornell Univ. (United States)en
dc.contributor.institutionSEMATECH Inc. (United States)en
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