Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography

Handle URI:
http://hdl.handle.net/10754/599789
Title:
Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography
Authors:
Yang, Yung-Lang; Hsu, Chin-Chi; Chang, Tien-Li; Kuo, Long-Sheng; Chen, Ping-Hei
Abstract:
This study presents the wetting properties, including hydrophilicity, hydrophobicity and anisotropic behavior, of water droplets on the silicon wafer surface with periodical nanopatterns and hierarchical structures. This study fabricates one- and two-dimensional periodical nanopatterns using laser interference lithography (LIL). The fabrication of hierarchical structures was effectively achieved by combining photolithography and LIL techniques. Unlike conventional fabrication methods, the LIL technique is mainly used to control the large-area design of periodical nanopatterns in this study. The minimum feature size for each nanopattern is 100 nm. This study shows that the wetting behavior of one-dimensional, two-dimensional, and hierarchical patterns can be obtained, benefiting the development of surface engineering for microfluidic systems. © 2010 Elsevier B.V. All rights reserved.
Citation:
Yang Y-L, Hsu C-C, Chang T-L, Kuo L-S, Chen P-H (2010) Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography. Applied Surface Science 256: 3683–3687. Available: http://dx.doi.org/10.1016/j.apsusc.2010.01.006.
Publisher:
Elsevier BV
Journal:
Applied Surface Science
KAUST Grant Number:
KUK-C1-014-12
Issue Date:
Mar-2010
DOI:
10.1016/j.apsusc.2010.01.006
Type:
Article
ISSN:
0169-4332
Sponsors:
This work was financially supported by Industrial Technology Research Institute through project number 8301XSY3K0, the KAUST Award through project number KUK-C1-014-12, and the NSC in Taiwan through grant number NSC96-2628-E-002-197MY3. We would also like to thank Chih-Chieh Su and We-Lang Lai for their expertise in the LIL process. Academic Editing is supported by National Science Council through project number 96-2217-E002-005-MY3.
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Full metadata record

DC FieldValue Language
dc.contributor.authorYang, Yung-Langen
dc.contributor.authorHsu, Chin-Chien
dc.contributor.authorChang, Tien-Lien
dc.contributor.authorKuo, Long-Shengen
dc.contributor.authorChen, Ping-Heien
dc.date.accessioned2016-02-28T06:09:51Zen
dc.date.available2016-02-28T06:09:51Zen
dc.date.issued2010-03en
dc.identifier.citationYang Y-L, Hsu C-C, Chang T-L, Kuo L-S, Chen P-H (2010) Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography. Applied Surface Science 256: 3683–3687. Available: http://dx.doi.org/10.1016/j.apsusc.2010.01.006.en
dc.identifier.issn0169-4332en
dc.identifier.doi10.1016/j.apsusc.2010.01.006en
dc.identifier.urihttp://hdl.handle.net/10754/599789en
dc.description.abstractThis study presents the wetting properties, including hydrophilicity, hydrophobicity and anisotropic behavior, of water droplets on the silicon wafer surface with periodical nanopatterns and hierarchical structures. This study fabricates one- and two-dimensional periodical nanopatterns using laser interference lithography (LIL). The fabrication of hierarchical structures was effectively achieved by combining photolithography and LIL techniques. Unlike conventional fabrication methods, the LIL technique is mainly used to control the large-area design of periodical nanopatterns in this study. The minimum feature size for each nanopattern is 100 nm. This study shows that the wetting behavior of one-dimensional, two-dimensional, and hierarchical patterns can be obtained, benefiting the development of surface engineering for microfluidic systems. © 2010 Elsevier B.V. All rights reserved.en
dc.description.sponsorshipThis work was financially supported by Industrial Technology Research Institute through project number 8301XSY3K0, the KAUST Award through project number KUK-C1-014-12, and the NSC in Taiwan through grant number NSC96-2628-E-002-197MY3. We would also like to thank Chih-Chieh Su and We-Lang Lai for their expertise in the LIL process. Academic Editing is supported by National Science Council through project number 96-2217-E002-005-MY3.en
dc.publisherElsevier BVen
dc.subjectHierarchical structuresen
dc.subjectHydrophilicen
dc.subjectHydrophobicen
dc.subjectLaser interference lithographyen
dc.subjectPeriodical nanostructuresen
dc.titleStudy on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithographyen
dc.typeArticleen
dc.identifier.journalApplied Surface Scienceen
dc.contributor.institutionNational Taiwan University, Taipei, Taiwanen
dc.contributor.institutionMechanical Industry Research Laboratories, Hsin-chu, Taiwanen
kaust.grant.numberKUK-C1-014-12en
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