Handle URI:
http://hdl.handle.net/10754/598812
Title:
Metal Oxide Nanoparticle Photoresists for EUV Patterning
Authors:
Jiang, Jing; Chakrabarty, Souvik; Yu, Mufei; Ober, Christopher K.
Abstract:
© 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.
Citation:
Jiang J, Chakrabarty S, Yu M, Ober CK (2014) Metal Oxide Nanoparticle Photoresists for EUV Patterning. Journal of Photopolymer Science and Technology 27: 663–666. Available: http://dx.doi.org/10.2494/photopolymer.27.663.
Publisher:
Technical Association of Photopolymers, Japan
Journal:
Journal of Photopolymer Science and Technology
Issue Date:
2014
DOI:
10.2494/photopolymer.27.663
Type:
Article
ISSN:
0914-9244; 1349-6336
Sponsors:
The authors gratefully acknowledgeSEMATECH for funding, as well as the CornellNanoscale Science and Technology Facility(CNF), Cornell Center of Materials Research(CCMR), the Nanobiotechnology Center (NBTC)and the KAUST-Cornell Center of Energy andSustainability (KAUST_CU) and LawrenceBerkeley National Lab (LBNL) for use of theirfacilities.
Appears in Collections:
Publications Acknowledging KAUST Support

Full metadata record

DC FieldValue Language
dc.contributor.authorJiang, Jingen
dc.contributor.authorChakrabarty, Souviken
dc.contributor.authorYu, Mufeien
dc.contributor.authorOber, Christopher K.en
dc.date.accessioned2016-02-25T13:41:43Zen
dc.date.available2016-02-25T13:41:43Zen
dc.date.issued2014en
dc.identifier.citationJiang J, Chakrabarty S, Yu M, Ober CK (2014) Metal Oxide Nanoparticle Photoresists for EUV Patterning. Journal of Photopolymer Science and Technology 27: 663–666. Available: http://dx.doi.org/10.2494/photopolymer.27.663.en
dc.identifier.issn0914-9244en
dc.identifier.issn1349-6336en
dc.identifier.doi10.2494/photopolymer.27.663en
dc.identifier.urihttp://hdl.handle.net/10754/598812en
dc.description.abstract© 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.en
dc.description.sponsorshipThe authors gratefully acknowledgeSEMATECH for funding, as well as the CornellNanoscale Science and Technology Facility(CNF), Cornell Center of Materials Research(CCMR), the Nanobiotechnology Center (NBTC)and the KAUST-Cornell Center of Energy andSustainability (KAUST_CU) and LawrenceBerkeley National Lab (LBNL) for use of theirfacilities.en
dc.publisherTechnical Association of Photopolymers, Japanen
dc.subjectEUVen
dc.subjectMetal oxideen
dc.subjectNanoparticleen
dc.subjectPhotoresisten
dc.titleMetal Oxide Nanoparticle Photoresists for EUV Patterningen
dc.typeArticleen
dc.identifier.journalJournal of Photopolymer Science and Technologyen
dc.contributor.institutionCornell University, Ithaca, United Statesen
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