Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

Handle URI:
http://hdl.handle.net/10754/598699
Title:
Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing
Authors:
Lee, Daeho; Pan, Heng; Sherry, Alex; Ko, Seung Hwan; Lee, Ming-Tsang; Kim, Eunpa; Grigoropoulos, Costas P
Abstract:
Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.
Citation:
Lee D, Pan H, Sherry A, Ko SH, Lee M-T, et al. (2012) Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing. Nanotechnology 23: 344012. Available: http://dx.doi.org/10.1088/0957-4484/23/34/344012.
Publisher:
IOP Publishing
Journal:
Nanotechnology
Issue Date:
10-Aug-2012
DOI:
10.1088/0957-4484/23/34/344012
PubMed ID:
22885478
Type:
Article
ISSN:
0957-4484; 1361-6528
Sponsors:
Support by the National Science Foundation under Grant CMMI 0820605 and by the King Abdullah University of Science and Technology (KAUST) is gratefully acknowledged.
Appears in Collections:
Publications Acknowledging KAUST Support

Full metadata record

DC FieldValue Language
dc.contributor.authorLee, Daehoen
dc.contributor.authorPan, Hengen
dc.contributor.authorSherry, Alexen
dc.contributor.authorKo, Seung Hwanen
dc.contributor.authorLee, Ming-Tsangen
dc.contributor.authorKim, Eunpaen
dc.contributor.authorGrigoropoulos, Costas Pen
dc.date.accessioned2016-02-25T13:34:40Zen
dc.date.available2016-02-25T13:34:40Zen
dc.date.issued2012-08-10en
dc.identifier.citationLee D, Pan H, Sherry A, Ko SH, Lee M-T, et al. (2012) Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing. Nanotechnology 23: 344012. Available: http://dx.doi.org/10.1088/0957-4484/23/34/344012.en
dc.identifier.issn0957-4484en
dc.identifier.issn1361-6528en
dc.identifier.pmid22885478en
dc.identifier.doi10.1088/0957-4484/23/34/344012en
dc.identifier.urihttp://hdl.handle.net/10754/598699en
dc.description.abstractLaser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.en
dc.description.sponsorshipSupport by the National Science Foundation under Grant CMMI 0820605 and by the King Abdullah University of Science and Technology (KAUST) is gratefully acknowledged.en
dc.publisherIOP Publishingen
dc.titleLarge-area nanoimprinting on various substrates by reconfigurable maskless laser direct writingen
dc.typeArticleen
dc.identifier.journalNanotechnologyen
dc.contributor.institutionUC Berkeley, Berkeley, United Statesen
dc.contributor.institutionKorea Advanced Institute of Science & Technology, Yusong, South Koreaen
dc.contributor.institutionNational Chung Hsing University, Taichung, Taiwanen

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