High-Density Chemical Intercalation of Zero-Valent Copper into Bi 2 Se 3 Nanoribbons

Handle URI:
http://hdl.handle.net/10754/598485
Title:
High-Density Chemical Intercalation of Zero-Valent Copper into Bi 2 Se 3 Nanoribbons
Authors:
Koski, Kristie J.; Cha, Judy J.; Reed, Bryan W.; Wessells, Colin D.; Kong, Desheng; Cui, Yi
Abstract:
A major goal of intercalation chemistry is to intercalate high densities of guest species without disrupting the host lattice. Many intercalant concentrations, however, are limited by the charge of the guest species. Here we have developed a general solution-based chemical method for intercalating extraordinarily high densities of zero-valent copper metal into layered Bi 2Se 3 nanoribbons. Up to 60 atom % copper (Cu 7.5Bi 2Se 3) can be intercalated with no disruption to the host lattice using a solution disproportionation redox reaction. © 2012 American Chemical Society.
Citation:
Koski KJ, Cha JJ, Reed BW, Wessells CD, Kong D, et al. (2012) High-Density Chemical Intercalation of Zero-Valent Copper into Bi 2 Se 3 Nanoribbons . Journal of the American Chemical Society 134: 7584–7587. Available: http://dx.doi.org/10.1021/ja300368x.
Publisher:
American Chemical Society (ACS)
Journal:
Journal of the American Chemical Society
KAUST Grant Number:
KUS-11-001-12
Issue Date:
9-May-2012
DOI:
10.1021/ja300368x
PubMed ID:
22524598
Type:
Article
ISSN:
0002-7863; 1520-5126
Sponsors:
Y.C. acknowledges support from a King Abdullah University of Science and Technology (KAUST) Investigator Award (KUS-11-001-12), the Keck Foundation, and the DARPA MESO Project (N66001-11-1-4105). B.W.R. was supported through grants from the U.S. Department of Energy (DOE), Office of Basic Energy Sciences, Division of Materials Science and Engineering, and the work was performed under the auspices of DOE by LLNL under Contract DE-AC52-07NA27344.
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Full metadata record

DC FieldValue Language
dc.contributor.authorKoski, Kristie J.en
dc.contributor.authorCha, Judy J.en
dc.contributor.authorReed, Bryan W.en
dc.contributor.authorWessells, Colin D.en
dc.contributor.authorKong, Deshengen
dc.contributor.authorCui, Yien
dc.date.accessioned2016-02-25T13:30:49Zen
dc.date.available2016-02-25T13:30:49Zen
dc.date.issued2012-05-09en
dc.identifier.citationKoski KJ, Cha JJ, Reed BW, Wessells CD, Kong D, et al. (2012) High-Density Chemical Intercalation of Zero-Valent Copper into Bi 2 Se 3 Nanoribbons . Journal of the American Chemical Society 134: 7584–7587. Available: http://dx.doi.org/10.1021/ja300368x.en
dc.identifier.issn0002-7863en
dc.identifier.issn1520-5126en
dc.identifier.pmid22524598en
dc.identifier.doi10.1021/ja300368xen
dc.identifier.urihttp://hdl.handle.net/10754/598485en
dc.description.abstractA major goal of intercalation chemistry is to intercalate high densities of guest species without disrupting the host lattice. Many intercalant concentrations, however, are limited by the charge of the guest species. Here we have developed a general solution-based chemical method for intercalating extraordinarily high densities of zero-valent copper metal into layered Bi 2Se 3 nanoribbons. Up to 60 atom % copper (Cu 7.5Bi 2Se 3) can be intercalated with no disruption to the host lattice using a solution disproportionation redox reaction. © 2012 American Chemical Society.en
dc.description.sponsorshipY.C. acknowledges support from a King Abdullah University of Science and Technology (KAUST) Investigator Award (KUS-11-001-12), the Keck Foundation, and the DARPA MESO Project (N66001-11-1-4105). B.W.R. was supported through grants from the U.S. Department of Energy (DOE), Office of Basic Energy Sciences, Division of Materials Science and Engineering, and the work was performed under the auspices of DOE by LLNL under Contract DE-AC52-07NA27344.en
dc.publisherAmerican Chemical Society (ACS)en
dc.titleHigh-Density Chemical Intercalation of Zero-Valent Copper into Bi 2 Se 3 Nanoribbonsen
dc.typeArticleen
dc.identifier.journalJournal of the American Chemical Societyen
dc.contributor.institutionStanford University, Palo Alto, United Statesen
dc.contributor.institutionLawrence Livermore National Laboratory, Livermore, United Statesen
dc.contributor.institutionStanford Linear Accelerator Center, Menlo Park, United Statesen
kaust.grant.numberKUS-11-001-12en
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