Enhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications

Handle URI:
http://hdl.handle.net/10754/592599
Title:
Enhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications
Authors:
Alias, Mohd Sharizal ( 0000-0003-1369-1421 ) ; Yang, Yang; Ng, Tien Khee ( 0000-0002-1480-6975 ) ; Dursun, Ibrahim ( 0000-0002-4408-3392 ) ; Shi, Dong ( 0000-0003-4009-2686 ) ; Saidaminov, Makhsud I. ( 0000-0002-3850-666X ) ; Priante, Davide ( 0000-0003-4540-2188 ) ; Bakr, Osman M. ( 0000-0002-3428-1002 ) ; Ooi, Boon S. ( 0000-0001-9606-5578 )
Abstract:
The high optical gain and absorption of organic–inorganic hybrid perovskites have attracted attention for photonic device applications. However, owing to the sensitivity of organic moieties to solvents and temperature, device processing is challenging, particularly for patterning. Here, we report the direct patterning of perovskites using chemically gas-assisted focused-ion beam (GAFIB) etching with XeF2 and I2 precursors. We demonstrate etching enhancement in addition to controllability and marginal surface damage compared to focused-ion beam (FIB) etching without precursors. Utilizing the GAFIB etching, we fabricated a uniform and periodic submicron perovskite subwavelength grating (SWG) absorber with broadband absorption and nanoscale precision. Our results demonstrate the use of FIB as a submicron patterning tool and a means of providing surface treatment (after FIB patterning to minimize optical loss) for perovskite photonic nanostructures. The SWG absorber can be patterned on perovskite solar cells to enhance the device efficiency through increasing light trapping and absorption.
KAUST Department:
Photonics Laboratory; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Imaging and Characterization Core Lab; Solar and Photovoltaic Engineering Research Center (SPERC); Physical Sciences and Engineering (PSE) Division
Citation:
Enhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications 2015:137 The Journal of Physical Chemistry Letters
Publisher:
American Chemical Society (ACS)
Journal:
The Journal of Physical Chemistry Letters
Issue Date:
22-Dec-2015
DOI:
10.1021/acs.jpclett.5b02558
Type:
Article
ISSN:
1948-7185
Additional Links:
http://pubs.acs.org/doi/10.1021/acs.jpclett.5b02558
Appears in Collections:
Articles; Advanced Nanofabrication, Imaging and Characterization Core Lab; Physical Sciences and Engineering (PSE) Division; Photonics Laboratory; Solar and Photovoltaic Engineering Research Center (SPERC); Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorAlias, Mohd Sharizalen
dc.contributor.authorYang, Yangen
dc.contributor.authorNg, Tien Kheeen
dc.contributor.authorDursun, Ibrahimen
dc.contributor.authorShi, Dongen
dc.contributor.authorSaidaminov, Makhsud I.en
dc.contributor.authorPriante, Davideen
dc.contributor.authorBakr, Osman M.en
dc.contributor.authorOoi, Boon S.en
dc.date.accessioned2015-12-27T05:57:53Zen
dc.date.available2015-12-27T05:57:53Zen
dc.date.issued2015-12-22en
dc.identifier.citationEnhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications 2015:137 The Journal of Physical Chemistry Lettersen
dc.identifier.issn1948-7185en
dc.identifier.doi10.1021/acs.jpclett.5b02558en
dc.identifier.urihttp://hdl.handle.net/10754/592599en
dc.description.abstractThe high optical gain and absorption of organic–inorganic hybrid perovskites have attracted attention for photonic device applications. However, owing to the sensitivity of organic moieties to solvents and temperature, device processing is challenging, particularly for patterning. Here, we report the direct patterning of perovskites using chemically gas-assisted focused-ion beam (GAFIB) etching with XeF2 and I2 precursors. We demonstrate etching enhancement in addition to controllability and marginal surface damage compared to focused-ion beam (FIB) etching without precursors. Utilizing the GAFIB etching, we fabricated a uniform and periodic submicron perovskite subwavelength grating (SWG) absorber with broadband absorption and nanoscale precision. Our results demonstrate the use of FIB as a submicron patterning tool and a means of providing surface treatment (after FIB patterning to minimize optical loss) for perovskite photonic nanostructures. The SWG absorber can be patterned on perovskite solar cells to enhance the device efficiency through increasing light trapping and absorption.en
dc.language.isoenen
dc.publisherAmerican Chemical Society (ACS)en
dc.relation.urlhttp://pubs.acs.org/doi/10.1021/acs.jpclett.5b02558en
dc.rightsArchived with thanks to The Journal of Physical Chemistry Letters. This is an open access article published under an ACS AuthorChoice License, which permits copying and redistribution of the article or any adaptations for non-commercial purposes. http://pubs.acs.org/page/policy/authorchoice_termsofuse.htmlen
dc.titleEnhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applicationsen
dc.typeArticleen
dc.contributor.departmentPhotonics Laboratoryen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentImaging and Characterization Core Laben
dc.contributor.departmentSolar and Photovoltaic Engineering Research Center (SPERC)en
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.identifier.journalThe Journal of Physical Chemistry Lettersen
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorAlias, Mohd Sharizalen
kaust.authorYang, Yangen
kaust.authorNg, Tien Kheeen
kaust.authorDursun, Ibrahimen
kaust.authorShi, Dongen
kaust.authorSaidaminov, Makhsud I.en
kaust.authorPriante, Davideen
kaust.authorBakr, Osman M.en
kaust.authorOoi, Boon S.en
All Items in KAUST are protected by copyright, with all rights reserved, unless otherwise indicated.