APT analyses of deuterium-loaded Fe/V multi-layered films

Handle URI:
http://hdl.handle.net/10754/577050
Title:
APT analyses of deuterium-loaded Fe/V multi-layered films
Authors:
Gemma, R.; Al-Kassab, Talaat; Kirchheim, R.; Pundt, A.
Abstract:
Interaction of hydrogen with metallic multi-layered thin films remains as a hot topic in recent days Detailed knowledge on such chemically modulated systems is required if they are desired for application in hydrogen energy system as storage media. In this study, the deuterium concentration profile of Fe/V multi-layer was investigated by atom probe tomography (APT) at 60 and 30 K. It is firstly shown that deuterium-loaded sample can easily react with oxygen at the Pd capping layer on Fe/V and therefore, it is highly desired to avoid any oxygen exposure after D(2) loading before APT analysis. The analysis temperature also has an impact on D concentration profile. The result taken at 60 K shows clear traces of surface segregation of D atoms towards analysis surface. The observed diffusion profile of D allows us to estimate an apparent diffusion coefficient D. The calculated D at 60 K is in the order of 10(-17) cm(2)/s, deviating 6 orders of magnitude from an extrapolated value. This was interpreted with alloying, D-trapping at defects and effects of the large extension to which the extrapolation was done. A D concentration profile taken at 30 K shows nosegregation anymore and a homogeneous distribution at C(D) = 0.05(2) D/Me, which is in good accordance with that measured in the corresponding pressure-composition isotherm. (C) 2008 Elsevier B.V. All rights reserved.
KAUST Department:
Materials Science and Engineering Program
Publisher:
Elsevier BV
Journal:
Ultramicroscopy
Issue Date:
Apr-2009
DOI:
10.1016/j.ultramic.2008.11.005
Type:
Article
ISSN:
0304-3991
Appears in Collections:
Articles; Materials Science and Engineering Program

Full metadata record

DC FieldValue Language
dc.contributor.authorGemma, R.en
dc.contributor.authorAl-Kassab, Talaaten
dc.contributor.authorKirchheim, R.en
dc.contributor.authorPundt, A.en
dc.date.accessioned2015-09-10T09:27:44Zen
dc.date.available2015-09-10T09:27:44Zen
dc.date.issued2009-04en
dc.identifier.issn0304-3991en
dc.identifier.doi10.1016/j.ultramic.2008.11.005en
dc.identifier.urihttp://hdl.handle.net/10754/577050en
dc.description.abstractInteraction of hydrogen with metallic multi-layered thin films remains as a hot topic in recent days Detailed knowledge on such chemically modulated systems is required if they are desired for application in hydrogen energy system as storage media. In this study, the deuterium concentration profile of Fe/V multi-layer was investigated by atom probe tomography (APT) at 60 and 30 K. It is firstly shown that deuterium-loaded sample can easily react with oxygen at the Pd capping layer on Fe/V and therefore, it is highly desired to avoid any oxygen exposure after D(2) loading before APT analysis. The analysis temperature also has an impact on D concentration profile. The result taken at 60 K shows clear traces of surface segregation of D atoms towards analysis surface. The observed diffusion profile of D allows us to estimate an apparent diffusion coefficient D. The calculated D at 60 K is in the order of 10(-17) cm(2)/s, deviating 6 orders of magnitude from an extrapolated value. This was interpreted with alloying, D-trapping at defects and effects of the large extension to which the extrapolation was done. A D concentration profile taken at 30 K shows nosegregation anymore and a homogeneous distribution at C(D) = 0.05(2) D/Me, which is in good accordance with that measured in the corresponding pressure-composition isotherm. (C) 2008 Elsevier B.V. All rights reserved.en
dc.publisherElsevier BVen
dc.titleAPT analyses of deuterium-loaded Fe/V multi-layered filmsen
dc.typeArticleen
dc.contributor.departmentMaterials Science and Engineering Programen
dc.identifier.journalUltramicroscopyen
dc.contributor.institutionUniv Gottingen, Inst Mat Phys, D-37077 Gottingen, Germanyen
kaust.authorAl-Kassab, Talaaten
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