Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer

Handle URI:
http://hdl.handle.net/10754/575504
Title:
Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer
Authors:
Alias, Mohd Sharizal ( 0000-0003-1369-1421 ) ; Liao, Hsien-Yu ( 0000-0002-6720-5831 ) ; Ng, Tien Khee ( 0000-0002-1480-6975 ) ; Ooi, Boon S. ( 0000-0001-9606-5578 )
Abstract:
Nanoscale periodic patterning on insulating materials using focused-ion beam (FIB) is challenging because of charging effect, which causes pattern distortion and resolution degradation. In this paper, the authors used a charging suppression scheme using electron conducting polymer for the implementation of FIB patterned dielectric subwavelength grating (SWG) reflector. Prior to the FIB patterning, the authors numerically designed the optimal structure and the fabrication tolerance for all grating parameters (period, grating thickness, fill-factor, and low refractive index layer thickness) using the rigorous-coupled wave analysis computation. Then, the authors performed the FIB patterning on the dielectric SWG reflector spin-coated with electron conducting polymer for the anticharging purpose. They also performed similar patterning using thin conductive film anticharging scheme (30 nm Cr coating) for comparison. Their results show that the electron conducting polymer anticharging scheme effectively suppressing the charging effect during the FIB patterning of dielectric SWG reflector. The fabricated grating exhibited nanoscale precision, high uniformity and contrast, constant patterning, and complied with fabrication tolerance for all grating parameters across the entire patterned area. Utilization of electron conducting polymer leads to a simpler anticharging scheme with high precision and uniformity for FIB patterning on insulator materials.
KAUST Department:
Photonics Laboratory; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Citation:
Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer 2015, 33 (6):06F701 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Publisher:
American Vacuum Society
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Issue Date:
19-Aug-2015
DOI:
10.1116/1.4929152
Type:
Article
ISSN:
2166-2746; 2166-2754
Additional Links:
http://scitation.aip.org/content/avs/journal/jvstb/33/6/10.1116/1.4929152
Appears in Collections:
Articles; Photonics Laboratory; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorAlias, Mohd Sharizalen
dc.contributor.authorLiao, Hsien-Yuen
dc.contributor.authorNg, Tien Kheeen
dc.contributor.authorOoi, Boon S.en
dc.date.accessioned2015-08-23T10:21:33Zen
dc.date.available2015-08-23T10:21:33Zen
dc.date.issued2015-08-19en
dc.identifier.citationCharging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer 2015, 33 (6):06F701 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomenaen
dc.identifier.issn2166-2746en
dc.identifier.issn2166-2754en
dc.identifier.doi10.1116/1.4929152en
dc.identifier.urihttp://hdl.handle.net/10754/575504en
dc.description.abstractNanoscale periodic patterning on insulating materials using focused-ion beam (FIB) is challenging because of charging effect, which causes pattern distortion and resolution degradation. In this paper, the authors used a charging suppression scheme using electron conducting polymer for the implementation of FIB patterned dielectric subwavelength grating (SWG) reflector. Prior to the FIB patterning, the authors numerically designed the optimal structure and the fabrication tolerance for all grating parameters (period, grating thickness, fill-factor, and low refractive index layer thickness) using the rigorous-coupled wave analysis computation. Then, the authors performed the FIB patterning on the dielectric SWG reflector spin-coated with electron conducting polymer for the anticharging purpose. They also performed similar patterning using thin conductive film anticharging scheme (30 nm Cr coating) for comparison. Their results show that the electron conducting polymer anticharging scheme effectively suppressing the charging effect during the FIB patterning of dielectric SWG reflector. The fabricated grating exhibited nanoscale precision, high uniformity and contrast, constant patterning, and complied with fabrication tolerance for all grating parameters across the entire patterned area. Utilization of electron conducting polymer leads to a simpler anticharging scheme with high precision and uniformity for FIB patterning on insulator materials.en
dc.language.isoenen
dc.publisherAmerican Vacuum Societyen
dc.relation.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/6/10.1116/1.4929152en
dc.rightsArchived with thanks to Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. © 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.en
dc.titleCharging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymeren
dc.typeArticleen
dc.contributor.departmentPhotonics Laboratoryen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.identifier.journalJournal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomenaen
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorLiao, Hsien-Yuen
kaust.authorNg, Tien Kheeen
kaust.authorAlias, Mohd Sharizalen
kaust.authorOoi, Boon S.en
All Items in KAUST are protected by copyright, with all rights reserved, unless otherwise indicated.