Bosch-like method for creating high aspect ratio poly(methyl methacrylate) (PMMA) structures

Handle URI:
http://hdl.handle.net/10754/565862
Title:
Bosch-like method for creating high aspect ratio poly(methyl methacrylate) (PMMA) structures
Authors:
Haiducu, Marius; Sameoto, Dan E.; Foulds, Ian G.; Johnstone, Robert W.; Parameswaran, M. Ash
Abstract:
This paper presents a method for etching millimetre-deep trenches in commercial grade PMMA using deep-UV at 254 nm. The method is based on consecutive cycles of irradiation and development of the exposed areas, respectively. The exposure segment is performed using an inexpensive, in-house built irradiation box while the development part is accomplished using an isopropyl alcohol (IPA):H2O developer. The method was tested and characterized by etching various dimension square test structures in commercial grade, mirrored acrylic. The undercut of the sidewalls due to the uncollimated nature of the irradiation light was dramatically alleviated by using a honeycomb metallic grid in between the irradiation source and the acrylic substrate and by rotating the latter using a direct current (DC) motor-driven stage. By using an extremely affordable set-up and non-toxic, environmentally friendly materials and substances, this process represents an excellent alternative to microfabricating microfluidic devices in particular and high aspect ratio structures in general using PMMA as substrate. © 2012 SPIE.
KAUST Department:
Electrical Engineering Program; Mechanical Engineering Program; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Publisher:
SPIE-Intl Soc Optical Eng
Journal:
Micromachining and Microfabrication Process Technology XVII
Conference/Event name:
Micromachining and Microfabrication Process Technology XVII
Issue Date:
2-Feb-2012
DOI:
10.1117/12.908690
Type:
Conference Paper
ISSN:
16057422
ISBN:
9780819488916
Appears in Collections:
Conference Papers; Electrical Engineering Program; Mechanical Engineering Program; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorHaiducu, Mariusen
dc.contributor.authorSameoto, Dan E.en
dc.contributor.authorFoulds, Ian G.en
dc.contributor.authorJohnstone, Robert W.en
dc.contributor.authorParameswaran, M. Ashen
dc.date.accessioned2015-08-11T13:43:58Zen
dc.date.available2015-08-11T13:43:58Zen
dc.date.issued2012-02-02en
dc.identifier.isbn9780819488916en
dc.identifier.issn16057422en
dc.identifier.doi10.1117/12.908690en
dc.identifier.urihttp://hdl.handle.net/10754/565862en
dc.description.abstractThis paper presents a method for etching millimetre-deep trenches in commercial grade PMMA using deep-UV at 254 nm. The method is based on consecutive cycles of irradiation and development of the exposed areas, respectively. The exposure segment is performed using an inexpensive, in-house built irradiation box while the development part is accomplished using an isopropyl alcohol (IPA):H2O developer. The method was tested and characterized by etching various dimension square test structures in commercial grade, mirrored acrylic. The undercut of the sidewalls due to the uncollimated nature of the irradiation light was dramatically alleviated by using a honeycomb metallic grid in between the irradiation source and the acrylic substrate and by rotating the latter using a direct current (DC) motor-driven stage. By using an extremely affordable set-up and non-toxic, environmentally friendly materials and substances, this process represents an excellent alternative to microfabricating microfluidic devices in particular and high aspect ratio structures in general using PMMA as substrate. © 2012 SPIE.en
dc.publisherSPIE-Intl Soc Optical Engen
dc.subjectDeep-UV patterningen
dc.subjectHigh-aspect ratio structuresen
dc.subjectMEMSen
dc.subjectMicrofluidicsen
dc.subjectPoly(methyl methacrylate) (PMMA)en
dc.titleBosch-like method for creating high aspect ratio poly(methyl methacrylate) (PMMA) structuresen
dc.typeConference Paperen
dc.contributor.departmentElectrical Engineering Programen
dc.contributor.departmentMechanical Engineering Programen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.identifier.journalMicromachining and Microfabrication Process Technology XVIIen
dc.conference.date24 January 2012 through 26 January 2012en
dc.conference.nameMicromachining and Microfabrication Process Technology XVIIen
dc.conference.locationSan Francisco, CAen
kaust.authorFoulds, Ian G.en
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