Direct measurement of graphene contact resistivity to pre-deposited metal in buried contact test structure

Handle URI:
http://hdl.handle.net/10754/564786
Title:
Direct measurement of graphene contact resistivity to pre-deposited metal in buried contact test structure
Authors:
Qaisi, Ramy M. ( 0000-0003-0968-5483 ) ; Smith, Casey; Ghoneim, Mohamed T. ( 0000-0002-5568-5284 ) ; Yu, Qingkai; Hussain, Muhammad Mustafa ( 0000-0003-3279-0441 )
Abstract:
We demonstrate a buried contact based novel test structure for direct contact resistivity measurement of graphene-metal interfaces. We also observe excellent contact resistivity 1 μO-cm2 without any additional surface modification suggesting that the intrinsic Au-graphene contact is sufficient for achieving devices with low contact resistance. The chemical mechanical polishing less test structure and data described herein highlights an ideal methodology for systematic screening and engineering of graphene-metal contact resistivity to enable low power high speed carbon electronics. © 2013 IEEE.
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Integrated Nanotechnology Lab; Electrical Engineering Program
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)
Journal:
2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)
Conference/Event name:
2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013
Issue Date:
Aug-2013
DOI:
10.1109/NANO.2013.6720966
Type:
Conference Paper
ISSN:
19449399
ISBN:
9781479906758
Appears in Collections:
Conference Papers; Electrical Engineering Program; Integrated Nanotechnology Lab; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorQaisi, Ramy M.en
dc.contributor.authorSmith, Caseyen
dc.contributor.authorGhoneim, Mohamed T.en
dc.contributor.authorYu, Qingkaien
dc.contributor.authorHussain, Muhammad Mustafaen
dc.date.accessioned2015-08-04T07:15:54Zen
dc.date.available2015-08-04T07:15:54Zen
dc.date.issued2013-08en
dc.identifier.isbn9781479906758en
dc.identifier.issn19449399en
dc.identifier.doi10.1109/NANO.2013.6720966en
dc.identifier.urihttp://hdl.handle.net/10754/564786en
dc.description.abstractWe demonstrate a buried contact based novel test structure for direct contact resistivity measurement of graphene-metal interfaces. We also observe excellent contact resistivity 1 μO-cm2 without any additional surface modification suggesting that the intrinsic Au-graphene contact is sufficient for achieving devices with low contact resistance. The chemical mechanical polishing less test structure and data described herein highlights an ideal methodology for systematic screening and engineering of graphene-metal contact resistivity to enable low power high speed carbon electronics. © 2013 IEEE.en
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en
dc.titleDirect measurement of graphene contact resistivity to pre-deposited metal in buried contact test structureen
dc.typeConference Paperen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentIntegrated Nanotechnology Laben
dc.contributor.departmentElectrical Engineering Programen
dc.identifier.journal2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)en
dc.conference.date5 August 2013 through 8 August 2013en
dc.conference.name2013 13th IEEE International Conference on Nanotechnology, IEEE-NANO 2013en
dc.conference.locationBeijingen
dc.contributor.institutionTexas State University, United Statesen
kaust.authorQaisi, Ramy M.en
kaust.authorSmith, Caseyen
kaust.authorGhoneim, Mohamed T.en
kaust.authorHussain, Muhammad Mustafaen
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