Fabrication of CMOS-compatible nanopillars for smart bio-mimetic CMOS image sensors

Handle URI:
http://hdl.handle.net/10754/564569
Title:
Fabrication of CMOS-compatible nanopillars for smart bio-mimetic CMOS image sensors
Authors:
Saffih, Faycal; Elshurafa, Amro M.; Mohammad, Mohammad Ali; Nelson-Fitzpatrick, Nathan E.; Evoy, S.
Abstract:
In this paper, nanopillars with heights of 1μm to 5μm and widths of 250nm to 500nm have been fabricated with a near room temperature etching process. The nanopillars were achieved with a continuous deep reactive ion etching technique and utilizing PMMA (polymethylmethacrylate) and Chromium as masking layers. As opposed to the conventional Bosch process, the usage of the unswitched deep reactive ion etching technique resulted in nanopillars with smooth sidewalls with a measured surface roughness of less than 40nm. Moreover, undercut was nonexistent in the nanopillars. The proposed fabrication method achieves etch rates four times faster when compared to the state-of-the-art, leading to higher throughput and more vertical side walls. The fabrication of the nanopillars was carried out keeping the CMOS process in mind to ultimately obtain a CMOS-compatible process. This work serves as an initial step in the ultimate objective of integrating photo-sensors based on these nanopillars seamlessly along with the controlling transistors to build a complete bio-inspired smart CMOS image sensor on the same wafer. © 2012 IEEE.
KAUST Department:
Physical Sciences and Engineering (PSE) Division; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)
Journal:
10th IEEE International NEWCAS Conference
Conference/Event name:
2012 IEEE 10th International New Circuits and Systems Conference, NEWCAS 2012
Issue Date:
Jun-2012
DOI:
10.1109/NEWCAS.2012.6329024
Type:
Conference Paper
ISBN:
9781467308595
Appears in Collections:
Conference Papers; Physical Sciences and Engineering (PSE) Division; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorSaffih, Faycalen
dc.contributor.authorElshurafa, Amro M.en
dc.contributor.authorMohammad, Mohammad Alien
dc.contributor.authorNelson-Fitzpatrick, Nathan E.en
dc.contributor.authorEvoy, S.en
dc.date.accessioned2015-08-04T07:04:11Zen
dc.date.available2015-08-04T07:04:11Zen
dc.date.issued2012-06en
dc.identifier.isbn9781467308595en
dc.identifier.doi10.1109/NEWCAS.2012.6329024en
dc.identifier.urihttp://hdl.handle.net/10754/564569en
dc.description.abstractIn this paper, nanopillars with heights of 1μm to 5μm and widths of 250nm to 500nm have been fabricated with a near room temperature etching process. The nanopillars were achieved with a continuous deep reactive ion etching technique and utilizing PMMA (polymethylmethacrylate) and Chromium as masking layers. As opposed to the conventional Bosch process, the usage of the unswitched deep reactive ion etching technique resulted in nanopillars with smooth sidewalls with a measured surface roughness of less than 40nm. Moreover, undercut was nonexistent in the nanopillars. The proposed fabrication method achieves etch rates four times faster when compared to the state-of-the-art, leading to higher throughput and more vertical side walls. The fabrication of the nanopillars was carried out keeping the CMOS process in mind to ultimately obtain a CMOS-compatible process. This work serves as an initial step in the ultimate objective of integrating photo-sensors based on these nanopillars seamlessly along with the controlling transistors to build a complete bio-inspired smart CMOS image sensor on the same wafer. © 2012 IEEE.en
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)en
dc.subjectBio-mimetic (bio-inspired) sensorsen
dc.subjectlight energy harvestingen
dc.subjectMixed mode etchingen
dc.subjectNano-Photo-Rod sensorsen
dc.subjectNanopillarsen
dc.subjectPseudo Bosch etchingen
dc.subjectSensarvestingen
dc.subjectSmart CMOS imageren
dc.subjectUnswitched etchingen
dc.titleFabrication of CMOS-compatible nanopillars for smart bio-mimetic CMOS image sensorsen
dc.typeConference Paperen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.identifier.journal10th IEEE International NEWCAS Conferenceen
dc.conference.date17 June 2012 through 20 June 2012en
dc.conference.name2012 IEEE 10th International New Circuits and Systems Conference, NEWCAS 2012en
dc.conference.locationMontreal, QCen
dc.contributor.institutionDepartment of Electrical and Computer Engineering, ECERF W2-085, University of Alberta, Edmonton, AB T6G 2V4, Canadaen
dc.contributor.institutionInstitute for Quantum Computing, University of Waterloo, 200 University Avenue. W, Waterloo, ON N2L 3G1, Canadaen
kaust.authorSaffih, Faycalen
kaust.authorElshurafa, Amro M.en
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