Annealing effect on the performance of sputtering deposited Metglas thin films

Handle URI:
http://hdl.handle.net/10754/564318
Title:
Annealing effect on the performance of sputtering deposited Metglas thin films
Authors:
Cai, Liang; Hu, Jing; Prorok, Barton C.; Gooneratne, Chinthaka Pasan; Kosel, Jürgen ( 0000-0002-8998-8275 )
Abstract:
Magnetostrictive sensors based on ferromagnetic materials have been widely used in detecting chemicals and biological species. The Metglas™ 2826MB is one of the bulk strip materials that is employed as the sensor platform. However, the sensitivity is limited by the large size of the sensors itself. In order to improve the sensitivity, we have developed a process to fabricate microscale sensors of 500 × 100 μm in size using conventional MEMS technology. As-deposited, the sensors suffered from internal stress, which was released by a annealing the sensors at 215 °C for two hours under vacuum condition. The annealing process improved the magnetic properties of the thin films and increased the resonant frequency of the sensor by 214 kHz.
KAUST Department:
Physical Sciences and Engineering (PSE) Division; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Electrical Engineering Program; Sensing, Magnetism and Microsystems Lab
Publisher:
Trans Tech Publications
Journal:
Materials Science Forum
Conference/Event name:
5th International Conference on Nanomaterials by Severe Plastic Deformation, NanoSPD5
Issue Date:
Dec-2010
DOI:
10.4028/www.scientific.net/MSF.667-669.1207
Type:
Conference Paper
ISSN:
02555476
ISBN:
9783037850077
Appears in Collections:
Conference Papers; Physical Sciences and Engineering (PSE) Division; Electrical Engineering Program; Sensing, Magnetism and Microsystems Lab; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorCai, Liangen
dc.contributor.authorHu, Jingen
dc.contributor.authorProrok, Barton C.en
dc.contributor.authorGooneratne, Chinthaka Pasanen
dc.contributor.authorKosel, Jürgenen
dc.date.accessioned2015-08-04T06:23:26Zen
dc.date.available2015-08-04T06:23:26Zen
dc.date.issued2010-12en
dc.identifier.isbn9783037850077en
dc.identifier.issn02555476en
dc.identifier.doi10.4028/www.scientific.net/MSF.667-669.1207en
dc.identifier.urihttp://hdl.handle.net/10754/564318en
dc.description.abstractMagnetostrictive sensors based on ferromagnetic materials have been widely used in detecting chemicals and biological species. The Metglas™ 2826MB is one of the bulk strip materials that is employed as the sensor platform. However, the sensitivity is limited by the large size of the sensors itself. In order to improve the sensitivity, we have developed a process to fabricate microscale sensors of 500 × 100 μm in size using conventional MEMS technology. As-deposited, the sensors suffered from internal stress, which was released by a annealing the sensors at 215 °C for two hours under vacuum condition. The annealing process improved the magnetic properties of the thin films and increased the resonant frequency of the sensor by 214 kHz.en
dc.publisherTrans Tech Publicationsen
dc.subjectAnnealingen
dc.subjectMagnetic sensorsen
dc.subjectMicrofabricationen
dc.subjectThin filmsen
dc.titleAnnealing effect on the performance of sputtering deposited Metglas thin filmsen
dc.typeConference Paperen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentElectrical Engineering Programen
dc.contributor.departmentSensing, Magnetism and Microsystems Laben
dc.identifier.journalMaterials Science Forumen
dc.conference.date21 March 2011 through 25 March 2011en
dc.conference.name5th International Conference on Nanomaterials by Severe Plastic Deformation, NanoSPD5en
dc.conference.locationNanjingen
dc.contributor.institutionMaterials Science and Engineering, Changzhou University, Chinaen
dc.contributor.institutionMaterials Engineering, Auburn University, United Statesen
kaust.authorGooneratne, Chinthaka Pasanen
kaust.authorKosel, Jürgenen
kaust.authorCai, Liangen
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