Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films

Handle URI:
http://hdl.handle.net/10754/564102
Title:
Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films
Authors:
Sun, Ke; Saadi, Fadl H.; Lichterman, Michael F.; Hale, William G.; Wang, Hsinping; Zhou, Xinghao; Plymale, Noah T.; Omelchenko, Stefan T.; He, Jr-Hau ( 0000-0003-1886-9241 ) ; Papadantonakis, Kimberly M.; Brunschwig, Bruce S.; Lewis, Nathan S.
Abstract:
Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g). © 2015, National Academy of Sciences. All rights reserved.
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Electrical Engineering Program; Nano Energy Lab
Publisher:
Proceedings of the National Academy of Sciences
Journal:
Proceedings of the National Academy of Sciences
Issue Date:
11-Mar-2015
DOI:
10.1073/pnas.1423034112
PubMed ID:
25762067
PubMed Central ID:
PMC4378389
Type:
Article
ISSN:
00278424
Sponsors:
This material is based on work performed by the Joint Center for Artificial Photosynthesis, a Department of Energy (DOE) Energy Innovation Hub, supported through the Office of Science of the US DOE under Award DE-SC0004993. N.T.P. acknowledges support from the Graduate Research Fellowship Program of the US National Science Foundation. B.S.B. was supported by the Beckman Institute of the California Institute of Technology. This work was also supported by the Gordon and Betty Moore Foundation under Award GBMF1225.
Additional Links:
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4378389
Appears in Collections:
Articles; Electrical Engineering Program; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorSun, Keen
dc.contributor.authorSaadi, Fadl H.en
dc.contributor.authorLichterman, Michael F.en
dc.contributor.authorHale, William G.en
dc.contributor.authorWang, Hsinpingen
dc.contributor.authorZhou, Xinghaoen
dc.contributor.authorPlymale, Noah T.en
dc.contributor.authorOmelchenko, Stefan T.en
dc.contributor.authorHe, Jr-Hauen
dc.contributor.authorPapadantonakis, Kimberly M.en
dc.contributor.authorBrunschwig, Bruce S.en
dc.contributor.authorLewis, Nathan S.en
dc.date.accessioned2015-08-03T12:32:14Zen
dc.date.available2015-08-03T12:32:14Zen
dc.date.issued2015-03-11en
dc.identifier.issn00278424en
dc.identifier.pmid25762067en
dc.identifier.doi10.1073/pnas.1423034112en
dc.identifier.urihttp://hdl.handle.net/10754/564102en
dc.description.abstractReactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g). © 2015, National Academy of Sciences. All rights reserved.en
dc.description.sponsorshipThis material is based on work performed by the Joint Center for Artificial Photosynthesis, a Department of Energy (DOE) Energy Innovation Hub, supported through the Office of Science of the US DOE under Award DE-SC0004993. N.T.P. acknowledges support from the Graduate Research Fellowship Program of the US National Science Foundation. B.S.B. was supported by the Beckman Institute of the California Institute of Technology. This work was also supported by the Gordon and Betty Moore Foundation under Award GBMF1225.en
dc.publisherProceedings of the National Academy of Sciencesen
dc.relation.urlhttp://www.ncbi.nlm.nih.gov/pmc/articles/PMC4378389en
dc.subjectElectrocatalysisen
dc.subjectNickel oxideen
dc.subjectPhotoanode stabilizationen
dc.subjectSolar-driven water oxidationen
dc.titleStable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide filmsen
dc.typeArticleen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentElectrical Engineering Programen
dc.contributor.departmentNano Energy Laben
dc.identifier.journalProceedings of the National Academy of Sciencesen
dc.identifier.pmcidPMC4378389en
dc.contributor.institutionDivision of Chemistry and Chemical Engineering, California Institute of TechnologyPasadena, CA, United Statesen
dc.contributor.institutionJoint Center for Artificial Photosynthesis, California Institute of TechnologyPasadena, CA, United Statesen
dc.contributor.institutionDivision of Engineering and Applied Sciences, California Institute of TechnologyPasadena, CA, United Statesen
dc.contributor.institutionDepartment of Chemistry, University of SouthamptonSouthampton, Hampshire, United Kingdomen
dc.contributor.institutionBeckman Institute Molecular Materials Research Center, California Institute of TechnologyPasadena, CA, United Statesen
dc.contributor.institutionKavli Nanoscience Institute, California Institute of TechnologyPasadena, CA, United Statesen
kaust.authorHe, Jr-Hauen
kaust.authorWang, Hsinpingen

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