Automatic detection of NIL defects using microscopy and image processing

Handle URI:
http://hdl.handle.net/10754/563118
Title:
Automatic detection of NIL defects using microscopy and image processing
Authors:
Pietroy, David; Gereige, Issam; Gourgon, Cécile
Abstract:
Nanoimprint Lithography (NIL) is a promising technology for low cost and large scale nanostructure fabrication. This technique is based on a contact molding-demolding process, that can produce number of defects such as incomplete filling, negative patterns, sticking. In this paper, microscopic imaging combined to a specific processing algorithm is used to detect numerically defects in printed patterns. Results obtained for 1D and 2D imprinted gratings with different microscopic image magnifications are presented. Results are independent on the device which captures the image (optical, confocal or electron microscope). The use of numerical images allows the possibility to automate the detection and to compute a statistical analysis of defects. This method provides a fast analysis of printed gratings and could be used to monitor the production of such structures. © 2013 Elsevier B.V. All rights reserved.
KAUST Department:
Solar and Photovoltaic Engineering Research Center (SPERC)
Publisher:
Elsevier BV
Journal:
Microelectronic Engineering
Issue Date:
Dec-2013
DOI:
10.1016/j.mee.2013.03.126
Type:
Article
ISSN:
01679317
Sponsors:
This work is supported by the NaPANIL european project.
Appears in Collections:
Articles; Solar and Photovoltaic Engineering Research Center (SPERC)

Full metadata record

DC FieldValue Language
dc.contributor.authorPietroy, Daviden
dc.contributor.authorGereige, Issamen
dc.contributor.authorGourgon, Cécileen
dc.date.accessioned2015-08-03T11:36:11Zen
dc.date.available2015-08-03T11:36:11Zen
dc.date.issued2013-12en
dc.identifier.issn01679317en
dc.identifier.doi10.1016/j.mee.2013.03.126en
dc.identifier.urihttp://hdl.handle.net/10754/563118en
dc.description.abstractNanoimprint Lithography (NIL) is a promising technology for low cost and large scale nanostructure fabrication. This technique is based on a contact molding-demolding process, that can produce number of defects such as incomplete filling, negative patterns, sticking. In this paper, microscopic imaging combined to a specific processing algorithm is used to detect numerically defects in printed patterns. Results obtained for 1D and 2D imprinted gratings with different microscopic image magnifications are presented. Results are independent on the device which captures the image (optical, confocal or electron microscope). The use of numerical images allows the possibility to automate the detection and to compute a statistical analysis of defects. This method provides a fast analysis of printed gratings and could be used to monitor the production of such structures. © 2013 Elsevier B.V. All rights reserved.en
dc.description.sponsorshipThis work is supported by the NaPANIL european project.en
dc.publisherElsevier BVen
dc.subjectDefects detectionen
dc.subjectImage processingen
dc.subjectNanoimprint lithographyen
dc.titleAutomatic detection of NIL defects using microscopy and image processingen
dc.typeArticleen
dc.contributor.departmentSolar and Photovoltaic Engineering Research Center (SPERC)en
dc.identifier.journalMicroelectronic Engineeringen
dc.contributor.institutionLaboratoire des Technologies de la Microélectronique (LTM), 17 rue des Martyrs, F-38 054 Grenoble Cedex 9, Franceen
kaust.authorGereige, Issamen
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