Dimensional characterization of biperiodic imprinted structures using optical scatterometry

Handle URI:
http://hdl.handle.net/10754/563111
Title:
Dimensional characterization of biperiodic imprinted structures using optical scatterometry
Authors:
Gereige, Issam; Pietroy, David; Eid, Jessica; Gourgon, Cécile
Abstract:
In this paper, we report on the characterization of biperiodic imprinted structures using a non-destructive optical technique commonly called scatterometry. The nanostructures consist of periodic arrays of square and circular dots which were imprinted in a thermoplastic polymer by thermal nanoimprint lithography. Optical measurements were performed using spectroscopic ellipsometry in the spectral region of 1.5-4 eV. The geometrical profiles of the imprinted structures were reconstructed using the Rigorous Coupled-Wave Analysis (RCWA) to model the diffraction phenomena by periodic gratings. The technique was also adapted for large scale evaluation of the imprint process. Uniqueness of the solution was examined by analyzing the diffraction of the structure at different experimental conditions, for instance at various angles of incidence. © 2013 Elsevier B.V. All rights reserved.
KAUST Department:
Solar and Photovoltaic Engineering Research Center (SPERC)
Publisher:
Elsevier BV
Journal:
Microelectronic Engineering
Issue Date:
Dec-2013
DOI:
10.1016/j.mee.2013.05.022
Type:
Article
ISSN:
01679317
Appears in Collections:
Articles; Solar and Photovoltaic Engineering Research Center (SPERC)

Full metadata record

DC FieldValue Language
dc.contributor.authorGereige, Issamen
dc.contributor.authorPietroy, Daviden
dc.contributor.authorEid, Jessicaen
dc.contributor.authorGourgon, Cécileen
dc.date.accessioned2015-08-03T11:36:02Zen
dc.date.available2015-08-03T11:36:02Zen
dc.date.issued2013-12en
dc.identifier.issn01679317en
dc.identifier.doi10.1016/j.mee.2013.05.022en
dc.identifier.urihttp://hdl.handle.net/10754/563111en
dc.description.abstractIn this paper, we report on the characterization of biperiodic imprinted structures using a non-destructive optical technique commonly called scatterometry. The nanostructures consist of periodic arrays of square and circular dots which were imprinted in a thermoplastic polymer by thermal nanoimprint lithography. Optical measurements were performed using spectroscopic ellipsometry in the spectral region of 1.5-4 eV. The geometrical profiles of the imprinted structures were reconstructed using the Rigorous Coupled-Wave Analysis (RCWA) to model the diffraction phenomena by periodic gratings. The technique was also adapted for large scale evaluation of the imprint process. Uniqueness of the solution was examined by analyzing the diffraction of the structure at different experimental conditions, for instance at various angles of incidence. © 2013 Elsevier B.V. All rights reserved.en
dc.publisherElsevier BVen
dc.subject2D patternsen
dc.subjectNanoimprint lithographyen
dc.subjectOptical scatterometryen
dc.titleDimensional characterization of biperiodic imprinted structures using optical scatterometryen
dc.typeArticleen
dc.contributor.departmentSolar and Photovoltaic Engineering Research Center (SPERC)en
dc.identifier.journalMicroelectronic Engineeringen
dc.contributor.institutionLaboratoire des Technologies de la Microelectronique, CNRS UMR 5129, 17 av. des martyrs, 38054 Grenoble, Franceen
kaust.authorGereige, Issamen
kaust.authorEid, Jessicaen
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