Reactively sputtered epitaxial γ′-Fe4N films: Surface morphology, microstructure, magnetic and electrical transport properties

Handle URI:
http://hdl.handle.net/10754/563019
Title:
Reactively sputtered epitaxial γ′-Fe4N films: Surface morphology, microstructure, magnetic and electrical transport properties
Authors:
Mi, Wenbo; Guo, Zaibing; Feng, X. P.; Bai, Haili
Abstract:
Epitaxial γ′-Fe4N films with (1 0 0) and (1 1 0) orientations have been fabricated by reactive sputtering; these films were characterized by X-ray θ-2θ and φ scans, pole figures and high-resolution transmission electron microscopy. The film surface is very smooth as the film is less than 58 nm thick. The films exhibit soft ferromagnetism, and the saturation magnetization decreases with an increase in temperature, following Bloch's spin wave theory. The films also exhibit a metallic conductance mechanism. Below 30 K, magnetoresistance (MR) is positive and increases linearly with the applied field in the high-field range. In the low-field range, MR increases abruptly. Above 30 K, MR is negative, and its value increases linearly with the applied field.
KAUST Department:
Core Labs
Publisher:
Elsevier BV
Journal:
Acta Materialia
Issue Date:
Oct-2013
DOI:
10.1016/j.actamat.2013.07.016
Type:
Article
ISSN:
13596454
Sponsors:
This work was supported by the National Natural Foundation of China (51172126) and the Key Project of Natural Foundation of Tianjin City (12JCZDJC27100).
Appears in Collections:
Articles

Full metadata record

DC FieldValue Language
dc.contributor.authorMi, Wenboen
dc.contributor.authorGuo, Zaibingen
dc.contributor.authorFeng, X. P.en
dc.contributor.authorBai, Hailien
dc.date.accessioned2015-08-03T11:33:51Zen
dc.date.available2015-08-03T11:33:51Zen
dc.date.issued2013-10en
dc.identifier.issn13596454en
dc.identifier.doi10.1016/j.actamat.2013.07.016en
dc.identifier.urihttp://hdl.handle.net/10754/563019en
dc.description.abstractEpitaxial γ′-Fe4N films with (1 0 0) and (1 1 0) orientations have been fabricated by reactive sputtering; these films were characterized by X-ray θ-2θ and φ scans, pole figures and high-resolution transmission electron microscopy. The film surface is very smooth as the film is less than 58 nm thick. The films exhibit soft ferromagnetism, and the saturation magnetization decreases with an increase in temperature, following Bloch's spin wave theory. The films also exhibit a metallic conductance mechanism. Below 30 K, magnetoresistance (MR) is positive and increases linearly with the applied field in the high-field range. In the low-field range, MR increases abruptly. Above 30 K, MR is negative, and its value increases linearly with the applied field.en
dc.description.sponsorshipThis work was supported by the National Natural Foundation of China (51172126) and the Key Project of Natural Foundation of Tianjin City (12JCZDJC27100).en
dc.publisherElsevier BVen
dc.subjectFe4Nen
dc.subjectMagnetic propertiesen
dc.subjectMagnetoresistanceen
dc.subjectStructureen
dc.titleReactively sputtered epitaxial γ′-Fe4N films: Surface morphology, microstructure, magnetic and electrical transport propertiesen
dc.typeArticleen
dc.contributor.departmentCore Labsen
dc.identifier.journalActa Materialiaen
dc.contributor.institutionTianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, Institute of Advanced Materials Physics, Tianjin University, Tianjin 300072, Chinaen
kaust.authorGuo, Zaibingen
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