Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

Handle URI:
http://hdl.handle.net/10754/562935
Title:
Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
Authors:
Zhao, Chao ( 0000-0002-9582-1068 ) ; Hedhili, Mohamed N. ( 0000-0002-3624-036X ) ; Li, Jingqi; Wang, Qingxiao; Yang, Yang; Chen, Long; LI, LIANG
Abstract:
The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.
KAUST Department:
Advanced Nanofabrication, Imaging and Characterization Core Lab; Core Labs
Publisher:
Elsevier BV
Journal:
Thin Solid Films
Issue Date:
Sep-2013
DOI:
10.1016/j.tsf.2013.06.010
Type:
Article
ISSN:
00406090
Appears in Collections:
Articles; Advanced Nanofabrication, Imaging and Characterization Core Lab

Full metadata record

DC FieldValue Language
dc.contributor.authorZhao, Chaoen
dc.contributor.authorHedhili, Mohamed N.en
dc.contributor.authorLi, Jingqien
dc.contributor.authorWang, Qingxiaoen
dc.contributor.authorYang, Yangen
dc.contributor.authorChen, Longen
dc.contributor.authorLI, LIANGen
dc.date.accessioned2015-08-03T11:16:10Zen
dc.date.available2015-08-03T11:16:10Zen
dc.date.issued2013-09en
dc.identifier.issn00406090en
dc.identifier.doi10.1016/j.tsf.2013.06.010en
dc.identifier.urihttp://hdl.handle.net/10754/562935en
dc.description.abstractThe growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.en
dc.publisherElsevier BVen
dc.subjectAtomic force microscopyen
dc.subjectAtomic layer depositionen
dc.subjectEllipsometeren
dc.subjectRaman spectroscopyen
dc.subjectTiO2 filmen
dc.subjectX-ray diffractionen
dc.titleGrowth and characterization of titanium oxide by plasma enhanced atomic layer depositionen
dc.typeArticleen
dc.contributor.departmentAdvanced Nanofabrication, Imaging and Characterization Core Laben
dc.contributor.departmentCore Labsen
dc.identifier.journalThin Solid Filmsen
kaust.authorZhao, Chaoen
kaust.authorHedhili, Mohamed N.en
kaust.authorLi, Jingqien
kaust.authorWang, Qingxiaoen
kaust.authorYang, Yangen
kaust.authorChen, Longen
kaust.authorLI, LIANGen
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