Time-and-frequency domains approach to data processing in multiwavelength optical scatterometry of dielectric gratings

Handle URI:
http://hdl.handle.net/10754/562484
Title:
Time-and-frequency domains approach to data processing in multiwavelength optical scatterometry of dielectric gratings
Authors:
Granet, Gérard; Melezhik, Petr N.; Sirenko, Kostyantyn; Yashina, Nataliya P.
Abstract:
This paper focuses on scatterometry problems arising in lithography production of periodic gratings. Namely, the paper introduces a theoretical and numerical-modeling-oriented approach to scatterometry problems and discusses its capabilities. The approach allows for reliable detection of deviations in gratings' critical dimensions (CDs) during the manufacturing process. The core of the approach is the one-to-one correspondence between the electromagnetic (EM) characteristics and the geometric/material properties of gratings. The approach is based on highly accurate solutions of initial boundary-value problems describing EM waves' interaction on periodic gratings. The advantage of the approach is the ability to perform simultaneously and interactively both in frequency and time domains under conditions of possible resonant scattering of EM waves by infinite or finite gratings. This allows a detection of CDs for a wide range of gratings, and, thus is beneficial for the applied scatterometry. (C) 2013 Optical Society of America
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Publisher:
The Optical Society
Journal:
Journal of the Optical Society of America A
Issue Date:
2013
DOI:
10.1364/josaa.30.000427
Type:
Article
ISSN:
10847529
Appears in Collections:
Articles; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorGranet, Gérarden
dc.contributor.authorMelezhik, Petr N.en
dc.contributor.authorSirenko, Kostyantynen
dc.contributor.authorYashina, Nataliya P.en
dc.date.accessioned2015-08-03T10:39:49Zen
dc.date.available2015-08-03T10:39:49Zen
dc.date.issued2013en
dc.identifier.issn10847529en
dc.identifier.doi10.1364/josaa.30.000427en
dc.identifier.urihttp://hdl.handle.net/10754/562484en
dc.description.abstractThis paper focuses on scatterometry problems arising in lithography production of periodic gratings. Namely, the paper introduces a theoretical and numerical-modeling-oriented approach to scatterometry problems and discusses its capabilities. The approach allows for reliable detection of deviations in gratings' critical dimensions (CDs) during the manufacturing process. The core of the approach is the one-to-one correspondence between the electromagnetic (EM) characteristics and the geometric/material properties of gratings. The approach is based on highly accurate solutions of initial boundary-value problems describing EM waves' interaction on periodic gratings. The advantage of the approach is the ability to perform simultaneously and interactively both in frequency and time domains under conditions of possible resonant scattering of EM waves by infinite or finite gratings. This allows a detection of CDs for a wide range of gratings, and, thus is beneficial for the applied scatterometry. (C) 2013 Optical Society of Americaen
dc.publisherThe Optical Societyen
dc.titleTime-and-frequency domains approach to data processing in multiwavelength optical scatterometry of dielectric gratingsen
dc.typeArticleen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.identifier.journalJournal of the Optical Society of America Aen
dc.contributor.institutionInstitut Pascal UMR 6602, Blaise Pascal University, 24 av. des Landais, 63177 Aubière Cedex, Franceen
dc.contributor.institutionInstitute of Radiophysics and Electronics of National Academy of Sciences of Ukraine (IRE NASU), 12 Acad. Proskura str., Kharkiv 61085, Ukraineen
kaust.authorSirenko, Kostyantynen
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