Focused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications

Handle URI:
http://hdl.handle.net/10754/561391
Title:
Focused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications
Authors:
Alias, Mohd Sharizal ( 0000-0003-1369-1421 ) ; Dursun, Ibrahim ( 0000-0002-4408-3392 ) ; Shi, Dong ( 0000-0003-4009-2686 ) ; Saidaminov, Makhsud I. ( 0000-0002-3850-666X ) ; Diallo, Elhadj Marwane; Priante, Davide ( 0000-0003-4540-2188 ) ; Ng, Tien Khee ( 0000-0002-1480-6975 ) ; Bakr, Osman M. ( 0000-0002-3428-1002 ) ; Ooi, Boon S. ( 0000-0001-9606-5578 )
Abstract:
The coherent amplified spontaneous emission and high photoluminescence quantum efficiency of organolead trihalide perovskite have led to research interest in this material for use in photonic devices. In this paper, the authors present a focused-ion beam patterning strategy for methylammonium lead tribromide (MAPbBr3) perovskite crystal for subwavelength grating nanophotonic applications. The essential parameters for milling, such as the number of scan passes, dwell time, ion dose, ion current, ion incident angle, and gas-assisted etching, were experimentally evaluated to determine the sputtering yield of the perovskite. Based on our patterning conditions, the authors observed that the sputtering yield ranged from 0.0302 to 0.0719 μm3/pC for the MAPbBr3 perovskite crystal. Using XeF2 for the focused-ion beam gas-assisted etching, the authors determined that the etching rate was reduced to between 0.40 and 0.97, depending on the ion dose, compared with milling with ions only. Using the optimized patterning parameters, the authors patterned binary and circular subwavelength grating reflectors on the MAPbBr3 perovskite crystal using the focused-ion beam technique. Based on the computed grating structure with around 97% reflectivity, all of the grating dimensions (period, duty cycle, and grating thickness) were patterned with nanoscale precision (>±3 nm), high contrast, and excellent uniformity. Our results provide a platform for utilizing the focused-ion beam technique for fast prototyping of photonic nanostructures or nanodevices on organolead trihalide perovskite.
KAUST Department:
Photonics Laboratory; Solar and Photovoltaic Engineering Research Center (SPERC); Advanced Nanofabrication and Thin Film Core Lab; Imaging and Characterization Core Lab; Physical Sciences and Engineering (PSE) Division; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Citation:
Focused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications 2015, 33 (5):051207 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Publisher:
AIP
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Issue Date:
30-Jul-2015
DOI:
10.1116/1.4927542
Type:
Article
ISSN:
2166-2746; 2166-2754
Sponsors:
The authors gratefully acknowledge the funding support from KAUST and King Abdulaziz City for Science and Technology TIC (Technology Innovation Center) for Solid-State Lighting at KAUST.
Additional Links:
http://scitation.aip.org/content/avs/journal/jvstb/33/5/10.1116/1.4927542
Appears in Collections:
Articles; Advanced Nanofabrication, Imaging and Characterization Core Lab; Physical Sciences and Engineering (PSE) Division; Photonics Laboratory; Solar and Photovoltaic Engineering Research Center (SPERC); Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorAlias, Mohd Sharizalen
dc.contributor.authorDursun, Ibrahimen
dc.contributor.authorShi, Dongen
dc.contributor.authorSaidaminov, Makhsud I.en
dc.contributor.authorDiallo, Elhadj Marwaneen
dc.contributor.authorPriante, Davideen
dc.contributor.authorNg, Tien Kheeen
dc.contributor.authorBakr, Osman M.en
dc.contributor.authorOoi, Boon S.en
dc.date.accessioned2015-08-02T06:27:05Zen
dc.date.available2015-08-02T06:27:05Zen
dc.date.issued2015-07-30en
dc.identifier.citationFocused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications 2015, 33 (5):051207 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomenaen
dc.identifier.issn2166-2746en
dc.identifier.issn2166-2754en
dc.identifier.doi10.1116/1.4927542en
dc.identifier.urihttp://hdl.handle.net/10754/561391en
dc.description.abstractThe coherent amplified spontaneous emission and high photoluminescence quantum efficiency of organolead trihalide perovskite have led to research interest in this material for use in photonic devices. In this paper, the authors present a focused-ion beam patterning strategy for methylammonium lead tribromide (MAPbBr3) perovskite crystal for subwavelength grating nanophotonic applications. The essential parameters for milling, such as the number of scan passes, dwell time, ion dose, ion current, ion incident angle, and gas-assisted etching, were experimentally evaluated to determine the sputtering yield of the perovskite. Based on our patterning conditions, the authors observed that the sputtering yield ranged from 0.0302 to 0.0719 μm3/pC for the MAPbBr3 perovskite crystal. Using XeF2 for the focused-ion beam gas-assisted etching, the authors determined that the etching rate was reduced to between 0.40 and 0.97, depending on the ion dose, compared with milling with ions only. Using the optimized patterning parameters, the authors patterned binary and circular subwavelength grating reflectors on the MAPbBr3 perovskite crystal using the focused-ion beam technique. Based on the computed grating structure with around 97% reflectivity, all of the grating dimensions (period, duty cycle, and grating thickness) were patterned with nanoscale precision (>±3 nm), high contrast, and excellent uniformity. Our results provide a platform for utilizing the focused-ion beam technique for fast prototyping of photonic nanostructures or nanodevices on organolead trihalide perovskite.en
dc.description.sponsorshipThe authors gratefully acknowledge the funding support from KAUST and King Abdulaziz City for Science and Technology TIC (Technology Innovation Center) for Solid-State Lighting at KAUST.en
dc.language.isoenen
dc.publisherAIPen
dc.relation.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/5/10.1116/1.4927542en
dc.rightsArchived with thanks to Journal of Vacuum Science & Technology B. © 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.en
dc.subjectSputteringen
dc.subjectDielectric oxidesen
dc.subjectMillingen
dc.subjectFocused ion beam technologyen
dc.subjectDiffraction gratingsen
dc.titleFocused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applicationsen
dc.typeArticleen
dc.contributor.departmentPhotonics Laboratoryen
dc.contributor.departmentSolar and Photovoltaic Engineering Research Center (SPERC)en
dc.contributor.departmentAdvanced Nanofabrication and Thin Film Core Laben
dc.contributor.departmentImaging and Characterization Core Laben
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.identifier.journalJournal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomenaen
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorAlias, Mohd Sharizalen
kaust.authorShi, Dongen
kaust.authorDiallo, Elhadjen
kaust.authorDursun, Ibrahimen
kaust.authorSaidaminov, Makhsud I.en
kaust.authorPriante, Davideen
kaust.authorNg, Tien Kheeen
kaust.authorBakr, Osman M.en
kaust.authorOoi, Boon S.en
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