Ultraviolet laser deposition of graphene thin films without catalytic layers

Handle URI:
http://hdl.handle.net/10754/552266
Title:
Ultraviolet laser deposition of graphene thin films without catalytic layers
Authors:
Sarath Kumar, S. R.; Alshareef, Husam N. ( 0000-0001-5029-2142 )
Abstract:
In this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.
KAUST Department:
Materials Science and Engineering Program
Citation:
Ultraviolet laser deposition of graphene thin films without catalytic layers 2013, 102 (1):012110 Applied Physics Letters
Journal:
Applied Physics Letters
Issue Date:
9-Jan-2013
DOI:
10.1063/1.4773987
Type:
Article
ISSN:
00036951
Additional Links:
http://scitation.aip.org/content/aip/journal/apl/102/1/10.1063/1.4773987
Appears in Collections:
Articles; Materials Science and Engineering Program

Full metadata record

DC FieldValue Language
dc.contributor.authorSarath Kumar, S. R.en
dc.contributor.authorAlshareef, Husam N.en
dc.date.accessioned2015-05-05T08:47:02Zen
dc.date.available2015-05-05T08:47:02Zen
dc.date.issued2013-01-09en
dc.identifier.citationUltraviolet laser deposition of graphene thin films without catalytic layers 2013, 102 (1):012110 Applied Physics Lettersen
dc.identifier.issn00036951en
dc.identifier.doi10.1063/1.4773987en
dc.identifier.urihttp://hdl.handle.net/10754/552266en
dc.description.abstractIn this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.en
dc.relation.urlhttp://scitation.aip.org/content/aip/journal/apl/102/1/10.1063/1.4773987en
dc.rightsArchived with thanks to Applied Physics Lettersen
dc.titleUltraviolet laser deposition of graphene thin films without catalytic layersen
dc.typeArticleen
dc.contributor.departmentMaterials Science and Engineering Programen
dc.identifier.journalApplied Physics Lettersen
dc.eprint.versionPublisher's Version/PDFen
kaust.authorSarath Kumar, S. R.en
kaust.authorAlshareef, Husam N.en
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