Electroless deposition of metal nanoparticle clusters: Effect of pattern distance

Handle URI:
http://hdl.handle.net/10754/552145
Title:
Electroless deposition of metal nanoparticle clusters: Effect of pattern distance
Authors:
Gentile, Francesco; Laura Coluccio, Maria; Candeloro, Patrizio; Barberio, Marianna; Perozziello, Gerardo; Francardi, Marco; Di Fabrizio, Enzo M. ( 0000-0001-5886-4678 )
Abstract:
Electroless plating is a deposition technique in which metal ions are reduced as atoms on specific patterned sites of a silicon surface to form metal nanoparticles (NPs) aggregates with the desired characteristics. Those NPs, in turn, can be used as constituents of surface enhanced Raman spectroscopy substrates, which are devices where the electromagnetic field and effects thereof are giantly amplified. Here, the electroless formation of nanostructures was studied as a function of the geometry of the substrate. High resolution, electron beam lithography techniques were used to obtain nonperiodic arrays of circular patterns, in which the spacing of patterns was varied over a significant range. In depositing silver atoms in those circuits, the authors found that the characteristics of the aggregates vary with the pattern distance. When the patterns are in close proximity, the interference of different groups of adjacent aggregates cannot be disregarded and the overall growth is reduced. Differently from this, when the patterns are sufficiently distant, the formation of metal clusters of NPs is independent on the spacing of the patterns. For the particular subset of parameters used here, this critical correlation distance is about three times the pattern diameter. These findings were explained within the framework of a diffusion limited aggregation model, which is a simulation method that can decipher the formation of nanoaggregates at an atomic level. In the discussion, the authors showed how this concept can be used to fabricate ordered arrays of silver nanospheres, where the size of those spheres may be regulated on varying the pattern distance, for applications in biosensing and single molecule detection.
KAUST Department:
Materials Science and Engineering Program; Physical Sciences and Engineering (PSE) Division
Citation:
Electroless deposition of metal nanoparticle clusters: Effect of pattern distance 2014, 32 (3):031804 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Issue Date:
3-Apr-2014
DOI:
10.1116/1.4870058
Type:
Article
ISSN:
2166-2746; 1520-8567
Additional Links:
http://scitation.aip.org/content/avs/journal/jvstb/32/3/10.1116/1.4870058
Appears in Collections:
Articles; Physical Sciences and Engineering (PSE) Division; Materials Science and Engineering Program

Full metadata record

DC FieldValue Language
dc.contributor.authorGentile, Francescoen
dc.contributor.authorLaura Coluccio, Mariaen
dc.contributor.authorCandeloro, Patrizioen
dc.contributor.authorBarberio, Mariannaen
dc.contributor.authorPerozziello, Gerardoen
dc.contributor.authorFrancardi, Marcoen
dc.contributor.authorDi Fabrizio, Enzo M.en
dc.date.accessioned2015-05-04T16:10:47Zen
dc.date.available2015-05-04T16:10:47Zen
dc.date.issued2014-04-03en
dc.identifier.citationElectroless deposition of metal nanoparticle clusters: Effect of pattern distance 2014, 32 (3):031804 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structuresen
dc.identifier.issn2166-2746en
dc.identifier.issn1520-8567en
dc.identifier.doi10.1116/1.4870058en
dc.identifier.urihttp://hdl.handle.net/10754/552145en
dc.description.abstractElectroless plating is a deposition technique in which metal ions are reduced as atoms on specific patterned sites of a silicon surface to form metal nanoparticles (NPs) aggregates with the desired characteristics. Those NPs, in turn, can be used as constituents of surface enhanced Raman spectroscopy substrates, which are devices where the electromagnetic field and effects thereof are giantly amplified. Here, the electroless formation of nanostructures was studied as a function of the geometry of the substrate. High resolution, electron beam lithography techniques were used to obtain nonperiodic arrays of circular patterns, in which the spacing of patterns was varied over a significant range. In depositing silver atoms in those circuits, the authors found that the characteristics of the aggregates vary with the pattern distance. When the patterns are in close proximity, the interference of different groups of adjacent aggregates cannot be disregarded and the overall growth is reduced. Differently from this, when the patterns are sufficiently distant, the formation of metal clusters of NPs is independent on the spacing of the patterns. For the particular subset of parameters used here, this critical correlation distance is about three times the pattern diameter. These findings were explained within the framework of a diffusion limited aggregation model, which is a simulation method that can decipher the formation of nanoaggregates at an atomic level. In the discussion, the authors showed how this concept can be used to fabricate ordered arrays of silver nanospheres, where the size of those spheres may be regulated on varying the pattern distance, for applications in biosensing and single molecule detection.en
dc.relation.urlhttp://scitation.aip.org/content/avs/journal/jvstb/32/3/10.1116/1.4870058en
dc.rightsArchived with thanks to Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structuresen
dc.titleElectroless deposition of metal nanoparticle clusters: Effect of pattern distanceen
dc.typeArticleen
dc.contributor.departmentMaterials Science and Engineering Programen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.identifier.journalJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structuresen
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.institutionBioNEM (Bio Nano Engineering and Technology for Medicine), University Magna Graecia of Catanzaro—Catanzaro 88100, Italy and Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italyen
dc.contributor.institutionBioNEM (Bio Nano Engineering and Technology for Medicine), University Magna Graecia of Catanzaro—Catanzaro 88100, Italyen
dc.contributor.institutionBioNEM (Bio Nano Engineering and Technology for Medicine), University Magna Graecia of Catanzaro—Catanzaro 88100, Italyen
dc.contributor.institutionDepartment of Physics, Università della Calabria, Via P. Bucci 33c, 87036 Rende, Italyen
dc.contributor.institutionBioNEM (Bio Nano Engineering and Technology for Medicine), University Magna Graecia of Catanzaro—Catanzaro 88100, Italyen
kaust.authorFrancardi, Marcoen
kaust.authorDi Fabrizio, Enzo M.en
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