Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

Handle URI:
http://hdl.handle.net/10754/550209
Title:
Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems
Authors:
Fan, Yiqiang; Li, Huawei; Yi, Ying; Foulds, Ian G.
Abstract:
We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Electromechanical Microsystems & Polymer Integration Research Lab (EMPIRe)
Citation:
Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems 2013, 12 (4):049701 Journal of Micro/Nanolithography, MEMS, and MOEMS
Publisher:
SPIE-Intl Soc Optical Eng
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
Issue Date:
16-Dec-2013
DOI:
10.1117/1.JMM.12.4.049701
Type:
Article
ISSN:
1932-5150
Additional Links:
http://nanolithography.spiedigitallibrary.org/article.aspx?doi=10.1117/1.JMM.12.4.049701
Appears in Collections:
Articles; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorFan, Yiqiangen
dc.contributor.authorLi, Huaweien
dc.contributor.authorYi, Yingen
dc.contributor.authorFoulds, Ian G.en
dc.date.accessioned2015-04-16T13:46:52Zen
dc.date.available2015-04-16T13:46:52Zen
dc.date.issued2013-12-16en
dc.identifier.citationLaser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems 2013, 12 (4):049701 Journal of Micro/Nanolithography, MEMS, and MOEMSen
dc.identifier.issn1932-5150en
dc.identifier.doi10.1117/1.JMM.12.4.049701en
dc.identifier.urihttp://hdl.handle.net/10754/550209en
dc.description.abstractWe report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.en
dc.publisherSPIE-Intl Soc Optical Engen
dc.relation.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?doi=10.1117/1.JMM.12.4.049701en
dc.rights© The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.en
dc.titleLaser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systemsen
dc.typeArticleen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentElectromechanical Microsystems & Polymer Integration Research Lab (EMPIRe)en
dc.identifier.journalJournal of Micro/Nanolithography, MEMS, and MOEMSen
dc.eprint.versionPublisher's Version/PDFen
kaust.authorFan, Yiqiangen
kaust.authorLi, Huaweien
kaust.authorYi, Yingen
kaust.authorFoulds, Ian G.en
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