Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers

Handle URI:
http://hdl.handle.net/10754/543734
Title:
Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers
Authors:
Rajamanickam, V.P.; Ferrara, L.; Toma, A.; Proietti Zaccaria, R.; Das, G.; Di Fabrizio, Enzo M. ( 0000-0001-5886-4678 ) ; Liberale, Carlo ( 0000-0002-5653-199X )
Abstract:
We present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.
KAUST Department:
Biological and Environmental Sciences and Engineering (BESE) Division; Physical Sciences and Engineering (PSE) Division
Citation:
Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers 2014, 121:135 Microelectronic Engineering
Journal:
Microelectronic Engineering
Issue Date:
Jun-2014
DOI:
10.1016/j.mee.2014.04.040
Type:
Article
ISSN:
01679317
Additional Links:
http://linkinghub.elsevier.com/retrieve/pii/S0167931714001877
Appears in Collections:
Articles; Physical Sciences and Engineering (PSE) Division; Biological and Environmental Sciences and Engineering (BESE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorRajamanickam, V.P.en
dc.contributor.authorFerrara, L.en
dc.contributor.authorToma, A.en
dc.contributor.authorProietti Zaccaria, R.en
dc.contributor.authorDas, G.en
dc.contributor.authorDi Fabrizio, Enzo M.en
dc.contributor.authorLiberale, Carloen
dc.date.accessioned2015-04-14T07:59:43Zen
dc.date.available2015-04-14T07:59:43Zen
dc.date.issued2014-06en
dc.identifier.citationSuitable photo-resists for two-photon polymerization using femtosecond fiber lasers 2014, 121:135 Microelectronic Engineeringen
dc.identifier.issn01679317en
dc.identifier.doi10.1016/j.mee.2014.04.040en
dc.identifier.urihttp://hdl.handle.net/10754/543734en
dc.description.abstractWe present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4′ bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780 nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures.en
dc.relation.urlhttp://linkinghub.elsevier.com/retrieve/pii/S0167931714001877en
dc.rightsArchived with thanks to Microelectronic Engineeringen
dc.titleSuitable photo-resists for two-photon polymerization using femtosecond fiber lasersen
dc.typeArticleen
dc.contributor.departmentBiological and Environmental Sciences and Engineering (BESE) Divisionen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.identifier.journalMicroelectronic Engineeringen
dc.eprint.versionPost-printen
dc.contributor.institutionNanostructures, Istituto Italiano di Tecnologia, via Morego 30, Genova I-16163, Italyen
dc.contributor.institutionUniversità degli Studi di Genova, Genova 16145, Italyen
dc.contributor.institutionLab. BIONEM, Dipartimento di Medicina Sperimentale e Clinica, Università degli Studi “Magna Graecia” di Catanzaro, viale Europa, I-88100 Catanzaro, Italyen
kaust.authorDi Fabrizio, Enzo M.en
kaust.authorLiberale, Carloen
All Items in KAUST are protected by copyright, with all rights reserved, unless otherwise indicated.