Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

Handle URI:
http://hdl.handle.net/10754/325313
Title:
Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography
Authors:
Beesley, David J.; Semple, James; Jagadamma, Lethy Krishnan ( 0000-0003-4226-017X ) ; Amassian, Aram ( 0000-0002-5734-1194 ) ; McLachlan, Martyn A.; Anthopoulos, Thomas D.; deMello, John C.
Abstract:
Coplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography - a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.2014 Macmillan Publishers Limited. All rights reserved.
KAUST Department:
Physical Sciences and Engineering (PSE) Division; Solar and Photovoltaic Engineering Research Center
Citation:
Beesley DJ, Semple J, Krishnan Jagadamma L, Amassian A, McLachlan MA, et al. (2014) Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography. Nature Communications 5. doi:10.1038/ncomms4933.
Publisher:
Springer Nature
Journal:
Nature Communications
Issue Date:
27-May-2014
DOI:
10.1038/ncomms4933
PubMed ID:
24861953
PubMed Central ID:
PMC4050269
Type:
Article
ISSN:
20411723
Appears in Collections:
Articles; Physical Sciences and Engineering (PSE) Division; Solar and Photovoltaic Engineering Research Center (SPERC)

Full metadata record

DC FieldValue Language
dc.contributor.authorBeesley, David J.en
dc.contributor.authorSemple, Jamesen
dc.contributor.authorJagadamma, Lethy Krishnanen
dc.contributor.authorAmassian, Aramen
dc.contributor.authorMcLachlan, Martyn A.en
dc.contributor.authorAnthopoulos, Thomas D.en
dc.contributor.authordeMello, John C.en
dc.date.accessioned2014-08-27T09:46:28Z-
dc.date.available2014-08-27T09:46:28Z-
dc.date.issued2014-05-27en
dc.identifier.citationBeesley DJ, Semple J, Krishnan Jagadamma L, Amassian A, McLachlan MA, et al. (2014) Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography. Nature Communications 5. doi:10.1038/ncomms4933.en
dc.identifier.issn20411723en
dc.identifier.pmid24861953en
dc.identifier.doi10.1038/ncomms4933en
dc.identifier.urihttp://hdl.handle.net/10754/325313en
dc.description.abstractCoplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography - a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.2014 Macmillan Publishers Limited. All rights reserved.en
dc.language.isoenen
dc.publisherSpringer Natureen
dc.rightsThis work is licensed under a Creative Commons Attribution 3.0 Unported License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/3.0/en
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/en
dc.subjectadhesive agenten
dc.subjectaluminumen
dc.subjectchromiumen
dc.subjectglueen
dc.subjectgolden
dc.subjectmetalen
dc.subjectnanocoatingen
dc.subjectnanomaterialen
dc.subjectresinen
dc.subjectself assembled monolayeren
dc.subjectasymmetryen
dc.subjectelectrodeen
dc.subjectelectronic equipmenten
dc.subjectmetalen
dc.subjectadhesionen
dc.subjectadhesion lithographyen
dc.subjectdiodeen
dc.subjectelasticityen
dc.subjectelectrical equipmenten
dc.subjectelectrochemical analysisen
dc.subjectforceen
dc.subjectnanofabricationen
dc.subjectnanogap electrodeen
dc.subjectoptoelectronic deviceen
dc.subjectphysical chemistryen
dc.subjectproceduresen
dc.subjectrigidityen
dc.subjectroom temperatureen
dc.titleSub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithographyen
dc.typeArticleen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.contributor.departmentSolar and Photovoltaic Engineering Research Centeren
dc.identifier.journalNature Communicationsen
dc.identifier.pmcidPMC4050269en
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.institutionDepartment of Physics, Imperial College London, Prince Consort Road, South Kensington, London SW7 2AZ, United Kingdomen
dc.contributor.institutionDepartment of Chemistry, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, United Kingdomen
dc.contributor.institutionDepartment of Materials, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, United Kingdomen
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorJagadamma, Lethy Krishnanen
kaust.authorAmassian, Aramen

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