Thinning and functionalization of few-layer graphene sheets by CF4 plasma treatment

Handle URI:
http://hdl.handle.net/10754/315760
Title:
Thinning and functionalization of few-layer graphene sheets by CF4 plasma treatment
Authors:
Shen, Chao; Cao, Ronggen; Cheng, Yingchun; Ding, Fei; Huang, Gaoshan; Mei, Yongfeng; Schwingenschlögl, Udo ( 0000-0003-4179-7231 )
Abstract:
Structural changes of few-layer graphene sheets induced by CF4 plasma treatment are studied by optical microscopy and Raman spectroscopy, together with theoretical simulation. Experimental results suggest a thickness reduction of few-layer graphene sheets subjected to prolonged CF4 plasma treatment while plasma treatment with short time only leads to fluorine functionalization on the surface layer by formation of covalent bonds. Raman spectra reveal an increase in disorder by physical disruption of the graphene lattice as well as functionalization during the plasma treatment. The F/CF3 adsorption and the lattice distortion produced are proved by theoretical simulation using density functional theory, which also predicts p-type doping and Dirac cone splitting in CF4 plasma-treated graphene sheets that may have potential in future graphene-based micro/nanodevices.
KAUST Department:
Physical Sciences and Engineering (PSE) Division; Computational Physics and Materials Science (CPMS)
Citation:
Shen C, Huang G, Cheng Y, Cao R, Ding F, et al. (2012) Thinning and functionalization of few-layer graphene sheets by CF4 plasma treatment. Nanoscale Research Letters 7: 268. doi:10.1186/1556-276X-7-268.
Publisher:
SpringerOpen
Journal:
Nanoscale Research Letters
Issue Date:
24-May-2012
DOI:
10.1186/1556-276X-7-268
PubMed ID:
22625875
PubMed Central ID:
PMC3458992
Type:
Article
ISSN:
1556-276X
Additional Links:
http://www.nanoscalereslett.com/content/7/1/268
Appears in Collections:
Articles; Physical Sciences and Engineering (PSE) Division; Computational Physics and Materials Science (CPMS)

Full metadata record

DC FieldValue Language
dc.contributor.authorShen, Chaoen
dc.contributor.authorCao, Ronggenen
dc.contributor.authorCheng, Yingchunen
dc.contributor.authorDing, Feien
dc.contributor.authorHuang, Gaoshanen
dc.contributor.authorMei, Yongfengen
dc.contributor.authorSchwingenschlögl, Udoen
dc.date.accessioned2014-04-13T13:03:30Z-
dc.date.available2014-04-13T13:03:30Z-
dc.date.issued2012-05-24en
dc.identifier.citationShen C, Huang G, Cheng Y, Cao R, Ding F, et al. (2012) Thinning and functionalization of few-layer graphene sheets by CF4 plasma treatment. Nanoscale Research Letters 7: 268. doi:10.1186/1556-276X-7-268.en
dc.identifier.issn1556-276Xen
dc.identifier.pmid22625875en
dc.identifier.doi10.1186/1556-276X-7-268en
dc.identifier.urihttp://hdl.handle.net/10754/315760en
dc.description.abstractStructural changes of few-layer graphene sheets induced by CF4 plasma treatment are studied by optical microscopy and Raman spectroscopy, together with theoretical simulation. Experimental results suggest a thickness reduction of few-layer graphene sheets subjected to prolonged CF4 plasma treatment while plasma treatment with short time only leads to fluorine functionalization on the surface layer by formation of covalent bonds. Raman spectra reveal an increase in disorder by physical disruption of the graphene lattice as well as functionalization during the plasma treatment. The F/CF3 adsorption and the lattice distortion produced are proved by theoretical simulation using density functional theory, which also predicts p-type doping and Dirac cone splitting in CF4 plasma-treated graphene sheets that may have potential in future graphene-based micro/nanodevices.en
dc.language.isoenen
dc.publisherSpringerOpenen
dc.relation.urlhttp://www.nanoscalereslett.com/content/7/1/268en
dc.rightsArchived with thanks to Nanoscale Research Lettersen
dc.subjectGraphene sheetsen
dc.subjectPlasmaen
dc.subjectThinningen
dc.subjectFunctionalizationen
dc.subjectRaman spectroscopyen
dc.subjectDensity functional theoryen
dc.subjectDirac cone splittingen
dc.titleThinning and functionalization of few-layer graphene sheets by CF4 plasma treatmenten
dc.typeArticleen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Divisionen
dc.contributor.departmentComputational Physics and Materials Science (CPMS)en
dc.identifier.journalNanoscale Research Lettersen
dc.identifier.pmcidPMC3458992en
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.institutionDepartment of Materials Science, Fudan University, Shanghai 200433, Chinaen
dc.contributor.institutionIBM Research-Zürich, Säumerstrasse 4, Rüschlikon CH-8803, Switzerlanden
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorCheng, Yingchunen
kaust.authorSchwingenschlögl, Udoen

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