Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips

Handle URI:
http://hdl.handle.net/10754/312975
Title:
Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips
Authors:
Khan, Yasser; Al-Falih, Hisham; Ng, Tien Khee ( 0000-0002-1480-6975 ) ; Ooi, Boon S. ( 0000-0001-9606-5578 ) ; Zhang, Yaping
Abstract:
Dynamic electrochemical etching technique is optimized to produce tungsten tips with controllable shape and radius of curvature of less than 10 nm. Nascent features such as dynamic electrochemical etching and reverse biasing after drop-off are utilized, and two-step dynamic electrochemical etching is introduced to produce extremely sharp tips with controllable aspect ratio. Electronic current shut-off time for conventional dc drop-off technique is reduced to ?36 ns using high speed analog electronics. Undesirable variability in tip shape, which is innate to static dc electrochemical etching, is mitigated with novel dynamic electrochemical etching. Overall, we present a facile and robust approach, whereby using a novel etchant level adjustment mechanism, 30° variability in cone angle and 1.5 mm controllability in cone length were achieved, while routinely producing ultra-sharp probes. © 2012 American Institute of Physics.
KAUST Department:
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division; Photonics Laboratory
Citation:
Khan Y, Al-Falih H, Zhang Y, Ng TK, Ooi BS (2012) Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips. Review of Scientific Instruments 83: 063708. doi:10.1063/1.4730045.
Publisher:
AIP Publishing
Journal:
Review of Scientific Instruments
Issue Date:
2012
DOI:
10.1063/1.4730045
Type:
Article
ISSN:
00346748
Additional Links:
http://link.aip.org/link/RSINAK/v83/i6/p063708/s1&Agg=doi
Appears in Collections:
Articles; Photonics Laboratory; Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division

Full metadata record

DC FieldValue Language
dc.contributor.authorKhan, Yasseren
dc.contributor.authorAl-Falih, Hishamen
dc.contributor.authorNg, Tien Kheeen
dc.contributor.authorOoi, Boon S.en
dc.contributor.authorZhang, Yapingen
dc.date.accessioned2014-02-17T04:56:20Z-
dc.date.available2014-02-17T04:56:20Z-
dc.date.issued2012en
dc.identifier.citationKhan Y, Al-Falih H, Zhang Y, Ng TK, Ooi BS (2012) Two-step controllable electrochemical etching of tungsten scanning probe microscopy tips. Review of Scientific Instruments 83: 063708. doi:10.1063/1.4730045.en
dc.identifier.issn00346748en
dc.identifier.doi10.1063/1.4730045en
dc.identifier.urihttp://hdl.handle.net/10754/312975en
dc.description.abstractDynamic electrochemical etching technique is optimized to produce tungsten tips with controllable shape and radius of curvature of less than 10 nm. Nascent features such as dynamic electrochemical etching and reverse biasing after drop-off are utilized, and two-step dynamic electrochemical etching is introduced to produce extremely sharp tips with controllable aspect ratio. Electronic current shut-off time for conventional dc drop-off technique is reduced to ?36 ns using high speed analog electronics. Undesirable variability in tip shape, which is innate to static dc electrochemical etching, is mitigated with novel dynamic electrochemical etching. Overall, we present a facile and robust approach, whereby using a novel etchant level adjustment mechanism, 30° variability in cone angle and 1.5 mm controllability in cone length were achieved, while routinely producing ultra-sharp probes. © 2012 American Institute of Physics.en
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.urlhttp://link.aip.org/link/RSINAK/v83/i6/p063708/s1&Agg=doien
dc.rightsArchived with thanks to Review of Scientific Instrumentsen
dc.titleTwo-step controllable electrochemical etching of tungsten scanning probe microscopy tipsen
dc.typeArticleen
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Divisionen
dc.contributor.departmentPhotonics Laboratoryen
dc.identifier.journalReview of Scientific Instrumentsen
dc.eprint.versionPublisher's Version/PDFen
dc.contributor.institutionCenter for Photonic and Multiscale Nanomaterials, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI 48109, United Statesen
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)en
kaust.authorKhan, Yasseren
kaust.authorNg, Tien Kheeen
kaust.authorOoi, Boon S.en
kaust.authorAl-Falih, Hishamen
kaust.authorZhang, Yapingen
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